Efficient Single‐Emitter Plasmonic Patch Antenna Fabrication by Deterministic in Situ Optical Lithography using Spatially Modulated Light

2022 ◽  
pp. 2108120
Author(s):  
Amit R. Dhawan ◽  
Michel Nasilowski ◽  
Zhiming Wang ◽  
Benoît Dubertret ◽  
Agnès Maître
Keyword(s):  
Patch Antenna ◽  
Optical Lithography ◽  
Single Emitter ◽  
Modulated Light ◽  
Spatially Modulated Light

scholarly journals In Situ Subcellular Detachment of Cells Using a Cell‐Friendly Photoresist and Spatially Modulated Light

2019 ◽  
Vol 6 (14) ◽  
pp. 1900566 ◽  
Author(s):  
Jeehun Park ◽  
Taeyup Kim ◽  
Jong Chul Choi ◽  
Junsang Doh
Keyword(s):  
A Cell ◽  
Modulated Light ◽  
Spatially Modulated Light

Detection of inhomogeneities in diffusive media using spatially modulated light

2009 ◽  
Vol 34 (14) ◽  
pp. 2156 ◽  
Author(s):  
Andrea Bassi ◽  
Cosimo D'Andrea ◽  
Gianluca Valentini ◽  
Rinaldo Cubeddu ◽  
Simon Arridge
Keyword(s):  
Modulated Light ◽  
Spatially Modulated Light

scholarly journals Fast 3D optical reconstruction in turbid media using spatially modulated light

2010 ◽  
Vol 1 (2) ◽  
pp. 471 ◽  
Author(s):  
Cosimo D’Andrea ◽  
Nicolas Ducros ◽  
Andrea Bassi ◽  
Simon Arridge ◽  
Gianluca Valentini
Keyword(s):  
Turbid Media ◽  
Optical Reconstruction ◽  
Modulated Light ◽  
Spatially Modulated Light

scholarly journals Spatial shift of spatially modulated light projected on turbid media

2008 ◽  
Vol 25 (11) ◽  
pp. 2833 ◽  
Author(s):  
Andrea Bassi ◽  
David J. Cuccia ◽  
Anthony J. Durkin ◽  
Bruce J. Tromberg
Keyword(s):  
Turbid Media ◽  
Spatial Shift ◽  
Modulated Light ◽  
Spatially Modulated Light

Transport in Thermal Dip Pen Nanolithography

2004 ◽  
Author(s):  
Brent A. Nelson ◽  
Tanya L. Wright ◽  
William P. King ◽  
Paul E. Sheehan ◽  
Lloyd J. Whitman
Keyword(s):  
Electron Beam ◽  
Atomic Force Microscope ◽  
Electron Beam Lithography ◽  
Room Temperature ◽  
Optical Lithography ◽  
Ambient Conditions ◽  
Atomic Force ◽  
Resolution Limits ◽  
Dip Pen Nanolithography

The manufacture of nanoscale devices is at present constrained by the resolution limits of optical lithography and the high cost of electron beam lithography. Furthermore, traditional silicon fabrication techniques are quite limited in materials compatibility and are not well-suited for the manufacture of organic and biological devices. One nanomanufacturing technique that could overcome these drawbacks is dip pen nanolithography (DPN), in which a chemical-coated atomic force microscope (AFM) tip deposits molecular ‘inks’ onto a substrate [1]. DPN has shown resolution as good as 5 nm [2] and has been performed with a large number of molecules, but has limitations. For molecules to ink the surface they must be mobile at room temperature, limiting the inks that can be used, and since the inks must be mobile in ambient conditions, there is no way to stop the deposition while the tip is in contact with the substrate. In-situ imaging of deposited molecules therefore causes contamination of the deposited features.

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