ChemInform Abstract: The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

Oxide Films ◽

Electron Cyclotron ◽

The Characterization of Electron Cyclotron Resonance Plasma Deposited Silicon Nitride and Silicon Oxide Films

Journal of The Electrochemical Society ◽

10.1149/1.2096295 ◽

1989 ◽

Vol 136 (10) ◽

pp. 2835-2840 ◽

Cited By ~ 14

Author(s):

Son Van Nguyen ◽

Kevin Albaugh

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Oxide Films ◽

Electron Cyclotron ◽

Effects of oxygen content on properties of silicon oxide films prepared at room temperature by sputtering-type electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.368683 ◽

1998 ◽

Vol 84 (8) ◽

pp. 4579-4584 ◽

Cited By ~ 5

Author(s):

Katsuhiko Furukawa ◽

Yichun Liu ◽

Hiroshi Nakashima ◽

Dawei Gao ◽

Yasuhiro Kashiwazaki ◽

...

Keyword(s):

Oxygen Content ◽

Cyclotron Resonance ◽

Room Temperature ◽

Silicon Oxide ◽

Oxide Films ◽

Electron Cyclotron ◽

Characterization of nitrogen-rich silicon nitride films grown by the electron cyclotron resonance plasma technique

Semiconductor Science and Technology ◽

10.1088/0268-1242/18/7/306 ◽

2003 ◽

Vol 18 (7) ◽

pp. 633-641 ◽

Cited By ~ 16

Author(s):

L Wang ◽

H S Reehal ◽

F L Mart nez ◽

E San Andr s ◽

A del Prado

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Technique ◽

Silicon Nitride Films ◽

Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

10.1117/12.324050 ◽

1998 ◽

Author(s):

Roberto R. Panepucci ◽

Jose A. Diniz ◽

Eduardo Carli ◽

Peter J. Tatschi ◽

Jacobus W. Swart

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Characterization of He-induced Bubble Formation in Tungsten due to Exposure from an Electron Cyclotron Resonance Plasma Source

Fusion Science & Technology ◽

10.1080/15361055.2017.1333856 ◽

2017 ◽

pp. 1-10 ◽

Cited By ~ 2

Author(s):

D. Donovan ◽

D. Buchenauer ◽

J. Whaley ◽

G. Wright ◽

C.M. Parish ◽

...

Keyword(s):

Cyclotron Resonance ◽

Bubble Formation ◽

Plasma Source ◽

Electron Cyclotron ◽

I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Picosecond time-resolved photoluminescence characterization of a-SiC:H films prepared by electron cyclotron resonance plasma

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80255-8 ◽

1991 ◽

Vol 137-138 ◽

pp. 859-862 ◽

Cited By ~ 4

Author(s):

S. Gangopadhyay ◽

M. Pleil ◽

W. Borst ◽

C. Young ◽

M. Kristiansen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron ◽

Time Resolved ◽

Time Resolved Photoluminescence ◽

Effect of preoxidation on deposition of thin gate-quality silicon oxide film at low temperature by using a sputter-type electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.366431 ◽

1997 ◽

Vol 82 (11) ◽

pp. 5680-5685 ◽

Cited By ~ 26

Author(s):

D. W. Gao ◽

Y. Kashiwazaki ◽

K. Muraoka ◽

H. Nakashima ◽

K. Furukawa ◽

...

Keyword(s):

Low Temperature ◽

Oxide Film ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron ◽

Silicon Oxide Film ◽

On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma

IEEE Conference Record - Abstracts. 1992 IEEE International Conference on Plasma ◽

10.1109/plasma.1992.697984 ◽

2005 ◽

Author(s):

Sun-Kyu Song ◽

Hong-young Chang

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Film Formation ◽

Electron Cyclotron ◽

Nitride Film ◽

Silicon Nitride Film ◽

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

Deposition of sacrificial silicon oxide layers by electron cyclotron resonance plasma

10.1116/1.2746331 ◽

2007 ◽

Vol 25 (4) ◽

pp. 1166 ◽

Cited By ~ 4

Author(s):

C. Biasotto ◽

A. M. Daltrini ◽

R. C. Teixeira ◽

F. A. Boscoli ◽

J. A. Diniz ◽

...

Keyword(s):

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron ◽

Oxide Layers ◽