Stability of Ru- and Ta-based metal gate electrodes in contact with dielectrics for Si-CMOS
2004 ◽
Vol 241
(10)
◽
pp. 2253-2267
◽
Zhiqiang Chen
◽
Veena Misra
◽
Ryan P. Haggerty
◽
Susanne Stemmer
2020 ◽
Vol 67
(4)
◽
pp. 1730-1736
Hongpeng Zhang
◽
Lei Yuan
◽
Xiaoyan Tang
◽
Jichao Hu
◽
Jianwu Sun
◽
...
2007 ◽
Vol 102
(7)
◽
pp. 074511
◽
J. K. Schaeffer
◽
D. C. Gilmer
◽
S. Samavedam
◽
M. Raymond
◽
A. Haggag
◽
...
2002 ◽
Vol 81
(22)
◽
pp. 4192-4194
◽
Tae-Ho Cha
◽
Dae-Gyu Park
◽
Tae-Kyun Kim
◽
Se-Aug Jang
◽
In-Seok Yeo
◽
...
2006 ◽
Vol 46
(1)
◽
pp. 69-76
◽
S. Chatterjee
◽
Y. Kuo
◽
J. Lu
◽
J.-Y. Tewg
◽
P. Majhi
2006 ◽
Vol 27
(3)
◽
pp. 148-150
◽
Chin-Lung Cheng
◽
Kuei-Shu Chang-Liao
◽
Tzu-Chen Wang
◽
Tien-Ko Wang
◽
Howard Chih-Hao Wang
2019 ◽
Vol 13
(2)
◽
pp. 201-207
Kenji Ohmori
◽
T. Chikyow
◽
Takuji Hosoi
◽
Heiji Watanabe
◽
Kiyomi Nakajima
◽
...
2006 ◽
Vol 27
(4)
◽
pp. 228-230
◽
Bei Chen
◽
R. Jha
◽
H. Lazar
◽
N. Biswas
◽
Jaehoon Lee
◽
...
2008 ◽
Vol 11
(4)
◽
pp. H81
◽
S. Y. Son
◽
P. Kumar
◽
J. S. Lee
◽
H. Cho
◽
H. S. Jung
◽
...
2008 ◽
Vol 52
(11)
◽
pp. 1810-1814
◽
Yanli Zhang
◽
Marvin H. White