scholarly journals Stability of Ru- and Ta-based metal gate electrodes in contact with dielectrics for Si-CMOS

2004 ◽  
Vol 241 (10) ◽  
pp. 2253-2267 ◽  
Author(s):  
Zhiqiang Chen ◽  
Veena Misra ◽  
Ryan P. Haggerty ◽  
Susanne Stemmer
2020 ◽  
Vol 67 (4) ◽  
pp. 1730-1736
Author(s):  
Hongpeng Zhang ◽  
Lei Yuan ◽  
Xiaoyan Tang ◽  
Jichao Hu ◽  
Jianwu Sun ◽  
...  

2007 ◽  
Vol 102 (7) ◽  
pp. 074511 ◽  
Author(s):  
J. K. Schaeffer ◽  
D. C. Gilmer ◽  
S. Samavedam ◽  
M. Raymond ◽  
A. Haggag ◽  
...  

2002 ◽  
Vol 81 (22) ◽  
pp. 4192-4194 ◽  
Author(s):  
Tae-Ho Cha ◽  
Dae-Gyu Park ◽  
Tae-Kyun Kim ◽  
Se-Aug Jang ◽  
In-Seok Yeo ◽  
...  

2006 ◽  
Vol 27 (3) ◽  
pp. 148-150 ◽  
Author(s):  
Chin-Lung Cheng ◽  
Kuei-Shu Chang-Liao ◽  
Tzu-Chen Wang ◽  
Tien-Ko Wang ◽  
Howard Chih-Hao Wang

2019 ◽  
Vol 13 (2) ◽  
pp. 201-207
Author(s):  
Kenji Ohmori ◽  
T. Chikyow ◽  
Takuji Hosoi ◽  
Heiji Watanabe ◽  
Kiyomi Nakajima ◽  
...  

2006 ◽  
Vol 27 (4) ◽  
pp. 228-230 ◽  
Author(s):  
Bei Chen ◽  
R. Jha ◽  
H. Lazar ◽  
N. Biswas ◽  
Jaehoon Lee ◽  
...  

2008 ◽  
Vol 11 (4) ◽  
pp. H81 ◽  
Author(s):  
S. Y. Son ◽  
P. Kumar ◽  
J. S. Lee ◽  
H. Cho ◽  
H. S. Jung ◽  
...  

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