scholarly journals Graphene-sealed Si/SiN cavities for high-resolution in situ electron microscopy of nano-confined solutions (Phys. Status Solidi B 12/2016)

2016 ◽  
Vol 253 (12) ◽  
pp. 2544-2544
Author(s):  
Haider Rasool ◽  
Gabriel Dunn ◽  
Aidin Fathalizadeh ◽  
Alex Zettl
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
In Situ Electron Microscopy

In situ Electron Microscopy and its applications to semiconductor reactions at high-resolution

1995 ◽  
Vol 53 ◽  
pp. 222-223
Author(s):  
Robert Sinclair
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Structural Evolution ◽  
Material Behavior ◽  
Ex Situ ◽  
In Situ Electron Microscopy ◽  
Specimen Area ◽  
Underlying Mechanisms ◽  
High Degree

In situ electron microscopy experiments can provide the most revealing insights into material behavior. However, in order to take full advantage of the observations, quantitative measurements are required so that the underlying mechanisms are completely interpreted. This approach also ensures that specimen and environmental artifacts do not play a role and that real “bulk” processes are being studied. These points are illustrated in this paper by reference to work on reactions in semiconductor systems, especially at high resolution.The technique and practice of in situ microscopy are quite exacting. Thus it is often necessary to record changes in the same specimen area for extensive periods of time (e.g., hours), under identical imaging conditions. One can never be sure when a significant event will take place, or sometimes whether it has actually occurred -- accordingly a high degree of acuity on behalf of the observer is essential. A number of procedures is recommended to check that the results are representative and reproducible, including comparing the structural evolution with that from ex situ samples both qualitatively and quantitatively (e.g., [1]). Some contemporary applications are given in a recent publication.

scholarly journals Nanofluidic Cells With Controlled Path Length and Liquid Flow for Rapid, High-Resolution in situ Electron Microscopy

2013 ◽  
Vol 19 (S2) ◽  
pp. 404-405
Author(s):  
C. Mueller ◽  
M. Harb ◽  
J.R. Dwyer ◽  
R.J.D. Miller
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Liquid Flow ◽  
Path Length ◽  
In Situ Electron Microscopy

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.

scholarly journals Contributions to High Resolution and In Situ Electron Microscopy

2018 ◽  
Vol 24 (S1) ◽  
pp. 10-11
Author(s):  
Robert Sinclair ◽  
Yunzhi Liu ◽  
Sangchul Lee ◽  
Ai Leen Koh
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
In Situ Electron Microscopy

mRNA localization by Electron microscopic in situ hybridization

1991 ◽  
Vol 49 ◽  
pp. 430-431
Author(s):  
J. A. Pollock ◽  
M. Martone ◽  
T. Deerinck ◽  
M. H. Ellisman
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Nucleic Acids ◽  
Recombinant Dna ◽  
Light And Electron Microscopy ◽  
Electron Microscopic ◽  
High Voltage Electron Microscopy ◽  
Functional Sites ◽  
Voltage Electron

Localization of specific proteins in cells by both light and electron microscopy has been facilitate by the availability of antibodies that recognize unique features of these proteins. High resolution localization studies conducted over the last 25 years have allowed biologists to study the synthesis, translocation and ultimate functional sites for many important classes of proteins. Recently, recombinant DNA techniques in molecular biology have allowed the production of specific probes for localization of nucleic acids by “in situ” hybridization. The availability of these probes potentially opens a new set of questions to experimental investigation regarding the subcellular distribution of specific DNA's and RNA's. Nucleic acids have a much lower “copy number” per cell than a typical protein, ranging from one copy to perhaps several thousand. Therefore, sensitive, high resolution techniques are required. There are several reasons why Intermediate Voltage Electron Microscopy (IVEM) and High Voltage Electron Microscopy (HVEM) are most useful for localization of nucleic acids in situ.

Ultrastructural analysis of the spatial distribution of MRNA

1992 ◽  
Vol 50 (1) ◽  
pp. 552-553
Author(s):  
Gary Bassell ◽  
Robert H. Singer
Keyword(s):  
Electron Microscopy ◽  
Spatial Distribution ◽  
In Situ Hybridization ◽  
High Resolution ◽  
Nucleic Acids ◽  
Colloidal Gold ◽  
Dna Probe ◽  
Nucleotide Analogs ◽  
Gold Particles

We have been investigating the spatial distribution of nucleic acids intracellularly using in situ hybridization. The use of non-isotopic nucleotide analogs incorporated into the DNA probe allows the detection of the probe at its site of hybridization within the cell. This approach therefore is compatible with the high resolution available by electron microscopy. Biotinated or digoxigenated probe can be detected by antibodies conjugated to colloidal gold. Because mRNA serves as a template for the probe fragments, the colloidal gold particles are detected as arrays which allow it to be unequivocally distinguished from background.

High-Resolution Resistance Mapping in SEM

2018 ◽  
Author(s):  
Grigore Moldovan ◽  
Wolfgang Joachimi ◽  
Guillaume Boetsch ◽  
Jörg Jatzkowski ◽  
Frank Altman
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
High Resolution ◽  
Reference Structure ◽  
Total Resistance ◽  
Embedded Electronics ◽  
Improved Performance ◽  
Mapping Techniques ◽  
Scanning Electron

Abstract This work presents advanced resistance mapping techniques based on Scanning Electron Microscopy (SEM) with nanoprobing systems and the related embedded electronics. Focus is placed on recent advances to reduce noise and increase speed, such as integration of dedicated in situ electronics into the nanoprobing platform, as well as an important transition from current-sensitive to voltagesensitive amplification. We show that it is now possible to record resistance maps with a resistance sensitivity in the 10W range, even when the total resistance of the mapped structures is in the range of 100W. A reference structure is used to illustrate the improved performance, and a lowresistance failure case is presented as an example of analysis made possible by these developments.

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