Preparation and electrical properties of ITO thin films by dip-coating process

1996 ◽  
Vol 31 (7) ◽  
pp. 1761-1766 ◽  
Author(s):  
Keishi Nishio ◽  
Tadanori Sei ◽  
Toshio Tsuchiya
2014 ◽  
Vol 10 (4) ◽  
pp. 869-878 ◽  
Author(s):  
Soaram Kim ◽  
Giwoong Nam ◽  
Hyunsik Yoon ◽  
Hyunggil Park ◽  
Hyonkwang Choi ◽  
...  

2013 ◽  
Vol 684 ◽  
pp. 279-284 ◽  
Author(s):  
Yu Ming Peng ◽  
Yan Kuin Su ◽  
Ru Yuan Yang

In this paper, the Indium Tin Oxide (ITO) thin films were prepared by a sol-gel dip coating method and then annealed at 600°C under different atmosphere (vacuum, N2 and 96.25%N2+3.75%H2). Their microstructure, optical and electrical properties were investigated and discussed. Suitable atmosphere can improve the crystalline of the ITO films, therefore the optical and electrical properties of the ITO films are improved. The uv-vis results showed the maximum of transmittance in the visible range (380-780 nm) of 85.6% and the lowest resistivity of 4.4×10-2 Ω-cm when the ITO films were annealed under 96.25% N2 with 3.75% H2 atmosphere.


2012 ◽  
Vol 2012 ◽  
pp. 1-7 ◽  
Author(s):  
Ru-Yuan Yang ◽  
Cheng-Jye Chu ◽  
Yu-Ming Peng ◽  
Hui-Ju Chueng

Tin-doped Indium oxide (ITO) thin films were prepared by sol-gel dip-coating technique using low-cost metal salts and organic solvents. The coated films were treated without annealing or annealed at 400°C and 600°C in 3% H2/97% N2mixtures atmosphere. Microstructure, optical, and electrical properties of the prepared ITO films were investigated in detail. The maximum transmittance in the visible range (380–780 nm) is 85.6%, and the best resistivity is5×10−2 Ω-cm when annealed at 600°C in 3% H2/97% N2mixtures atmosphere. It is found that the optical and electrical properties of the prepared ITO films are strongly related to the microstructure variation. The organic compounds could not be removed completely, and the prepared ITO thin films were not dense when the prepared ITO film was annealed at 600°C in 3% H2/97% N2mixtures atmosphere, causing the poor conductivity.


2006 ◽  
Vol 45 ◽  
pp. 2355-2361 ◽  
Author(s):  
Patcharaporn Itthivisit ◽  
Samart Kongtaweelert ◽  
Sakda Traisak

Indium tin oxide (In-Sn-O, ITO) system is typical widely used as transparent electrodes for display devices, transparent coatings for solar energy heat mirrors and window films in p-n heterojunction solar cells because of their’s unique properties of a high visible transparency, good electrical conductivity, and excellent adhesion to the substrate, stable chemical property and easy patterning ability. In this paper, preparation and characterization of Indium tin oxide (ITO) thin films were studied by deposited dip coating process onto glass substrate. The mixing of various molar ratio of indium chloride (InCl3) and tin chloride (SnCl2.2H2O), (In:Sn mole ratio , 9:1, 7:3, 1:1), in acetylacetone were used as the starting solution. The suitable In:Sn ratio for one stoichiometry indium tin oxide (In2Sn2O7) compound were studied via hydrolysis process of mixed solution. The result of thermal gravimetric analysis were used to supported and corrected of calcining temperature. The precipitated powders were calcined at 500 0C and 600 0C. The result of XRD spectrum indicated that the calcined 9:1 powders at 6000C was show the highest stoichiometry of indium tin oxide (In2Sn2O7) compound with a polycrystalline cubic structure. The ITO thin films were studied by deposited dip coating process onto glass substrate with 20 layers at 600 0C for 1 hour. The optical properties, band gap energy and microstructure of ITO thin films were investigated by UV-vis spectrophotometer and Scaning Electron Microscope (SEM) respectively. The result of SEM was shown highly homogeneous surface and average grain size 20 nm with 95% transmittance which corresponding to XRD results. The calculated energy gap of ITO film was 3.40 eV.


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