Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions

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pp. 383-389 ◽  
Author(s):  
S. Veintemillas ◽  
V. Madigou ◽  
R. Rodríguez-Clemente ◽  
A. Figueras
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pp. 903 ◽  
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G. Costrini ◽  
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pp. 1496 ◽  
Author(s):  
B. Jalali ◽  
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W.S. Hobson ◽  
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pp. 868-873 ◽  
Author(s):  
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Wlodek Strupinski ◽  
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Ekmel Ozbay

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