Thermodynamic analysis of metalorganic chemical vapour deposition of SiC using tetramethylsilane as precursor. I. Identification of the main reactions
1995 ◽
Vol 148
(4)
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pp. 383-389
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1995 ◽
Vol 148
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pp. 390-395
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1996 ◽
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pp. 628-630
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2010 ◽
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pp. 245402
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2006 ◽
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2006 ◽
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pp. 868-873
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1994 ◽
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1993 ◽
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