Preparation and characterization of indium tin oxide films produced by the d.c. sputtering technique

1985 ◽  
Vol 128 (3-4) ◽  
pp. 231-239 ◽  
Author(s):  
J. Bhattacharyya ◽  
S. Chaudhuri ◽  
D. De ◽  
A.K. Pal
2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu

1985 ◽  
Vol 57 (2) ◽  
pp. 384-392 ◽  
Author(s):  
K. Sreenivas ◽  
T. Sudersena Rao ◽  
Abhai Mansingh ◽  
Subhash Chandra

2003 ◽  
Vol 126 (9) ◽  
pp. 509-513 ◽  
Author(s):  
C. Liu ◽  
T. Mihara ◽  
T. Matsutani ◽  
T. Asanuma ◽  
M. Kiuchi

1998 ◽  
Vol 317 (1-2) ◽  
pp. 161-164
Author(s):  
H Metzner ◽  
S Habenicht ◽  
Th Hahn ◽  
M Uhrmacher ◽  
K.-P Lieb ◽  
...  

2005 ◽  
Vol 37 (4) ◽  
pp. 385-392 ◽  
Author(s):  
Stephen W. Gaarenstroom ◽  
Michael P. Balogh ◽  
Maria C. Militello ◽  
Richard A. Waldo ◽  
Curtis A. Wong ◽  
...  

1988 ◽  
Vol 35 (1-2) ◽  
pp. 207-213 ◽  
Author(s):  
K.R. Murali ◽  
V. Sambasivam ◽  
M. Jayachandran ◽  
Mary Juliana Chockalingam ◽  
N. Rangarajan ◽  
...  

2001 ◽  
Vol 34 (17) ◽  
pp. 2606-2609 ◽  
Author(s):  
M Martino ◽  
A Luches ◽  
M Fernández ◽  
P Anobile ◽  
V Petruzzelli

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