Properties of carbon films produced by R.F. Plasma chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90023-6 ◽

1990 ◽

Vol 43-44 ◽

pp. 813-820 ◽

Author(s):

Hideki Minagawa ◽

Ichiro Fujita ◽

Tomoaki Hino ◽

Toshiro Yamashina

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text

Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/4/053 ◽

2008 ◽

Vol 17 (4) ◽

pp. 1467-1471 ◽

Author(s):

Gu Guang-Rui ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Field Emission ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Quartz Tube ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text

Surface characterisation of carbon films produced by plasma chemical vapour deposition method

Surface Engineering ◽

10.1179/1743294413y.0000000137 ◽

2013 ◽

Vol 29 (6) ◽

pp. 474-478 ◽

Author(s):

A. Khettache ◽

T. Staedler ◽

M. Z. Touhami ◽

H. Weiß ◽

X. Jiang

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Deposition Method ◽

Plasma Chemical ◽

Surface Characterisation ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

Download Full-text

Tribological study of hydrogenated amorphous carbon films with tailored microstructure and composition produced by bias-enhanced plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2010.03.017 ◽

2010 ◽

Vol 19 (7-9) ◽

pp. 1093-1102 ◽

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agulló-Rueda ◽

R. Gago ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Tribological Study ◽

Plasma Chemical Vapour Deposition ◽

Hydrogenated Amorphous

Download Full-text

PROPERTIES OF CARBON FILMS PRODUCED BY R.F. PLASMA CHEMICAL VAPOUR DEPOSITION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50083-8 ◽

1990 ◽

pp. 813-820

Author(s):

HIDEKI MINAGAWA ◽

ICHIRO FUJITA ◽

TOMOAKI HINO ◽

TOSHIRO YAMASHINA

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text

Effect of mixing oxygen or diborane on the formation of amorphous carbon films from methane by r.f. plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(88)90427-0 ◽

1988 ◽

Vol 163 ◽

pp. 229-232 ◽

Author(s):

C.R. Aiyer ◽

S.A. Gangal ◽

K. Montasser ◽

S. Morita ◽

S. Hattori

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapour Deposition

Download Full-text

Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

Download Full-text

Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

Download Full-text

InAlGaN-based ridge-guide laser diodes using remote plasma chemical vapour deposition for enhanced performance

Novel In-Plane Semiconductor Lasers XX ◽

10.1117/12.2584047 ◽

2021 ◽

Author(s):

Josh D. Brown ◽

Satya Barik ◽

Qian Gao ◽

Brad Siskavich ◽

Marie Wintrebert-Fouquet ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Laser Diodes ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Download Full-text

MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

Download Full-text

The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

Download Full-text