Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO2 thin films by DC magnetron sputtering

Abstract ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%.

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Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta 2 O 5 ) 0.85 (TiO 2 ) 0.15 /p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2018.01.001 ◽

2018 ◽

Vol 76 ◽

pp. 80-86 ◽

Cited By ~ 6

Author(s):

M. Chandra Sekhar ◽

N. Nanda Kumar Reddy ◽

B. Purusottam Reddy ◽

B. Poorna Prakash ◽

Harish Sharma Akkera ◽

...

Keyword(s):

Magnetron Sputtering ◽

Electronic Properties ◽

Schottky Barrier ◽

Bias Voltage ◽

Crystallographic Structure ◽

Substrate Bias ◽

Dc Magnetron Sputtering ◽

Substrate Bias Voltage ◽

Optical And Electronic Properties ◽

Influence Of Substrate

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Dielectric properties of TiO2 thin films deposited by a DC magnetron sputtering system

Thin Solid Films ◽

10.1016/s0040-6090(00)01027-0 ◽

2000 ◽

Vol 372 (1-2) ◽

pp. 246-249 ◽

Cited By ~ 60

Author(s):

Marius D Stamate

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

Tio2 Thin Films ◽

Sputtering System

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The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Journal of Electrical Engineering ◽

10.2478/jee-2019-0051 ◽

2019 ◽

Vol 70 (7) ◽

pp. 112-116

Author(s):

Mourad Azibi ◽

Nadia Saoula ◽

Hamid Aknouche

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Electrochemical Properties ◽

Bias Voltage ◽

Biomedical Application ◽

Substrate Bias ◽

Radio Frequency Magnetron Sputtering ◽

Substrate Bias Voltage ◽

Force Microscopy

Abstract In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

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