Blue and near-infrared up-conversion photoluminescence and dielectric relaxation of Tm3+/Yb3+ co-doped (Bi, Y)2Ti2O7 pyrochlore thin films

2014 ◽  
Vol 148 ◽  
pp. 121-128 ◽  
Author(s):  
Jianxiong Zhao ◽  
Ni Qin ◽  
Dinghua Bao
2015 ◽  
Vol 17 (18) ◽  
pp. 11974-11980 ◽  
Author(s):  
Xiaowei Zhang ◽  
Shaobing Lin ◽  
Tao Lin ◽  
Pei Zhang ◽  
Jun Xu ◽  
...  

High performance near-infrared luminous using broadband UV pumping.


2019 ◽  
Vol 40 (5) ◽  
pp. 623-629
Author(s):  
陈若望 CHEN Ruo-wang ◽  
汪鹏君 WANG Peng-jun ◽  
张晓伟 ZHANG Xiao-wei ◽  
张跃军 ZHANG Yue-jun ◽  
张会红 ZHANG Hui-hong ◽  
...  

MRS Advances ◽  
2017 ◽  
Vol 2 (52) ◽  
pp. 2989-2995
Author(s):  
K. Tucto ◽  
L. Flores ◽  
J. Guerra ◽  
J. Töfflinger ◽  
J. Dulanto ◽  
...  

ABSTRACTTerbium and ytterbium co-doped aluminum oxynitride thin films were grown onto silicon substrates using radiofrequency magnetron sputtering. Aluminum oxynitride samples doped with 4.6 at. % of Yb3+ and co-doped with 0.4 at. % of Tb3+ were obtained. The prepared samples were annealed from 150°C to 850°C in steps of 100°C. By using energy dispersive X-ray analysis we measured the sample composition and the doping concentration. The emission intensities at different annealing temperatures were characterized using photoluminescence measurements upon excitation at 325 nm. The 5D4 → 7F5 main transition of Tb3+ and the characteristic near infrared emission at 980 nm of Yb3+ were recorded. In order to study the luminescence behavior of the samples in terms of a down conversion process, we have plotted the integrated areas of the main transition peaks versus the annealing temperature.


2014 ◽  
Vol 2 (14) ◽  
pp. 2482 ◽  
Author(s):  
Beibei Xu ◽  
Jianhua Hao ◽  
Qiangbing Guo ◽  
Juechen Wang ◽  
Gongxun Bai ◽  
...  

2008 ◽  
Author(s):  
Xiaomei Guo ◽  
Kewen Kevin. Li ◽  
Xuesheng Chen ◽  
Yingyin Kevin. Zou ◽  
Hua Jiang

2010 ◽  
Vol 25 (7) ◽  
pp. 711-716 ◽  
Author(s):  
Xue-Tao WANG ◽  
Li-Ping ZHU ◽  
Zhi-Gao YE ◽  
Zhi-Zhen YE ◽  
Bing-Hui ZHAO

2021 ◽  
pp. 118082
Author(s):  
Hai Ma ◽  
Xiaodan Wang ◽  
Feifei Chen ◽  
Jiafan Chen ◽  
Xionghui Zeng ◽  
...  

2021 ◽  
Vol 866 ◽  
pp. 158568
Author(s):  
Jiaming Liu ◽  
Xin Huang ◽  
Heng Pan ◽  
Xu Zhang ◽  
Xiujie Fang ◽  
...  

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