Impact of different annealing conditions on physical properties of ZnSe thin films for ecofriendly buffer layer applications

2020 ◽  
Vol 132 ◽  
pp. 110982 ◽  
Author(s):  
Deepak Suthar ◽  
G. Chasta ◽  
Himanshu ◽  
S.L. Patel ◽  
S. Chander ◽  
...  
2020 ◽  
Vol 117 ◽  
pp. 113845 ◽  
Author(s):  
S. Chuhadiya ◽  
R. Sharma ◽  
Himanshu ◽  
S.L. Patel ◽  
S. Chander ◽  
...  

2020 ◽  
Vol 384 (4) ◽  
pp. 126097 ◽  
Author(s):  
Ritika Sharma ◽  
Himanshu ◽  
S.L. Patel ◽  
S. Chander ◽  
M.D. Kannan ◽  
...  

1990 ◽  
Vol 164-165 ◽  
pp. 1178-1185 ◽  
Author(s):  
D.H.A. Blank ◽  
W.A.M. Aarnink ◽  
J. Flokstra ◽  
H. Rogalla ◽  
A. van Silfhout

1988 ◽  
Vol 3 (2) ◽  
pp. 344-350 ◽  
Author(s):  
C. Ortiz ◽  
G. Lim ◽  
M. M. Chen ◽  
G. Castillo

This paper describes the complexity of the spinel iron oxides in thin-film configuration. First, the experimental deposition conditions are determined for the parameters of substrate temperature and oxygen flow such that only the “Fe3O4” phase is formed. Then a study is made of how the structural (grain size, lattice parameter, texture), magnetic (M), and optical (visible and infrared transmission) properties of the films depend on the deposition and postdeposition (air annealing) conditions. The experimental deposition region is defined where the films have the most similar physical properties to bulk Fe3O4 and subsequently, after annealing, to bulk gamma Fe2O3. Finally, a discussion is presented of a model that accounts for the anomalous, low values of the magnetic moment for the samples deposited at room temperature. The model proposes an overpopulation of the iron tetrahedral A sites.


2000 ◽  
Vol 361-362 ◽  
pp. 172-176 ◽  
Author(s):  
A. Rumberg ◽  
Ch. Sommerhalter ◽  
M. Toplak ◽  
A. Jäger-Waldau ◽  
M.Ch. Lux-Steiner

1996 ◽  
Vol 446 ◽  
Author(s):  
Hong Wang ◽  
S. X. Shang ◽  
X. J. Su ◽  
Z. Wang ◽  
M. Wang

AbstractInsulating thin films of Bi2Ti2O7 with (111) orientation have been prepared on silicon (100)–substrates at a temperature range of 480–550 °C by a MOCVD technique. The dielectric and C‐V properties were studied. The dielectric constant (ɛ) and loss tangent (tanδ) were found to be 180 and 0.01, respectively. The temperature and frequency dependence of dielectric constant were also measured. The Bi2Ti2O7 films are suitable to be used as a novel buffer layer and new insulating gate material in FET devices.


2013 ◽  
Vol 586 (1) ◽  
pp. 129-137 ◽  
Author(s):  
Maeng Jun Kim ◽  
Sung Ho Lee ◽  
Hong Tak Kim ◽  
Sang Ho Sohn

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