Preparation and characterization of CrN thin film by DC reactive magnetron sputtering

2018 ◽  
Vol 5 (7) ◽  
pp. 15224-15227 ◽  
Author(s):  
W. Siriprom ◽  
C. Chananonnawathorn ◽  
S. Kongsriprapan ◽  
K. Teanchai ◽  
Herman ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

2011 ◽  
Vol 13 (2) ◽  
pp. 314-320 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
A. Sivasankar Reddy ◽  
Kee-Sun Lee ◽  
P. Sreedhara Reddy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Deposition and Characterization of Thin Si-B-C-N Films by DC Reactive Magnetron Sputtering of Composed Si/B4C Target

2019 ◽  
Vol 41 (2) ◽  
pp. 90-97 ◽  
Author(s):  
A. A. Onoprienko ◽  
V. I. Ivashchenko ◽  
A. O. Kozak ◽  
A. K. Sinelnichenko ◽  
T. V. Tomila
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Growth of Anatase TiO2 Thin Film for Photokilling of Bacteria by DC Reactive Magnetron Sputtering Technique

2013 ◽  
Vol 770 ◽  
pp. 173-176 ◽  
Author(s):  
Suree Tongwanichniyom ◽  
Wichian Siriprom ◽  
Dhonluck Manop ◽  
Adisorn Buranawong ◽  
Jakrapong Kaewkhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Magnetron Sputtering ◽  
Gas Flow ◽  
Uv Light ◽  
Grazing Incidence ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Force Microscopy ◽  
Dc Reactive Magnetron Sputtering

Titanium dioxide (TiO2) thin films have been deposited on Si-wafer and glass slide by DC reactive magnetron sputtering technique at different O2 gas flow rates. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD), surface morphology was analyzed by atomic force microscopy (AFM) and disinfection of surfaces by photo catalytic oxidation with TiO2 and UV light irradiation. The results showed that, from GIXRD results, all as-deposited TiO2 films have crystal structure of TiO2 corresponding to the A(101) and A(200). AFM results showed that the film thicknesses increase from 183 nm to 238 nm with increasing of O2 gas flow rate, while the film roughness was in range of 4.8 nm to 5.9 nm. The as-deposited anatase TiO2 thin film in this work can kill the bacteria when expose to the UV light.

Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering

2011 ◽  
Vol 520 (1) ◽  
pp. 272-279 ◽  
Author(s):  
M. Horprathum ◽  
P. Eiamchai ◽  
P. Chindaudom ◽  
N. Nuntawong ◽  
V. Patthanasettakul ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Pulsed Dc ◽  
Dc Reactive Magnetron Sputtering

Preparation and characterization of transparent conductive ZnO:Ga films by DC reactive magnetron sputtering

2008 ◽  
Vol 59 (2) ◽  
pp. 124-128 ◽  
Author(s):  
Quan-Bao Ma ◽  
Zhi-Zhen Ye ◽  
Hai-Ping He ◽  
Jing-Rui Wang ◽  
Li-Ping Zhu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering
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