Effect of post-deposition annealing temperature on CeO2 thin film deposited on silicon substrate via RF magnetron sputtering technique

2011 ◽  
Vol 14 (2) ◽  
pp. 101-107 ◽  
Author(s):  
Soo Kiet Chuah ◽  
Kuan Yew Cheong ◽  
Zainovia Lockman ◽  
Zainuriah Hassan
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Silicon Substrate ◽  
Annealing Temperature ◽  
Rf Magnetron Sputtering ◽  
Post Deposition Annealing ◽  
Post Deposition

Preparation and Character Measurements of ZrO2 Films for RF Magnetron Sputtering

2012 ◽  
Vol 490-495 ◽  
pp. 3358-3361
Author(s):  
Tai Long Gui ◽  
Ji Ying Wen ◽  
Jin Shuo Mei
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Transmission Rate ◽  
Research Result ◽  
Rf Magnetron Sputtering ◽  
Post Deposition Annealing ◽  
Zro2 Film ◽  
Glass Substrates ◽  
Post Deposition

ZrO2 thin films were deposited on glass substrates via RF magnetron sputtering technique and post-deposition annealing treatment.The films transmittance and surface structure were investigated by means of Ultraviolet spectrophotometer, AFM and XRD. The effect of annealing on the optical properties of the films has been studied as well.The research result indicates that the size of ZrO2 film grain obviously gets bigger, the surface is more smooth and transmission rate increases after 800°C, annealing 30min.

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