Quantitative X-ray microtomography study of 3-D void growth induced by electromigration in eutectic SnPb flip-chip solder joints

2011 ◽  
Vol 65 (7) ◽  
pp. 646-649 ◽  
Author(s):  
Tian Tian ◽  
Kai Chen ◽  
A.A. MacDowell ◽  
Dula Parkinson ◽  
Yi-Shao Lai ◽  
...  
2006 ◽  
Vol 89 (22) ◽  
pp. 221906 ◽  
Author(s):  
Fan-Yi Ouyang ◽  
K. N. Tu ◽  
Yi-Shao Lai ◽  
Andriy M. Gusak

2012 ◽  
Vol 15 (7) ◽  
pp. 541-549
Author(s):  
Hisashi Tanie ◽  
Shinichi Fujiwara ◽  
Nobuhiko Chiwata ◽  
Masaru Fujiyoshi ◽  
Hiroshi Shintani ◽  
...  

2008 ◽  
Vol 1116 ◽  
Author(s):  
Kai Chen ◽  
Nobumichi Tamura ◽  
King-Ning Tu

AbstractThe rotation of Sn grains in Pb-free flip chip solder joints hasn't been reported in literature so far although it has been observed in Sn strips. In this letter, we report the detailed study of the grain orientation evolution induced by electromigration by synchrotron based white beam X-ray microdiffraction. It is found that the grains in solder joint rotate more slowly than in Sn strip even under higher current density. On the other hand, based on our estimation, the reorientation of the grains in solder joints also results in the reduction of electric resistivity, similar to the case of Sn strip. We will also discuss the reason why the electric resistance decreases much more in strips than in the Sn-based solders, and the different driving force for the grain growth in solder joint and in thin film interconnect lines.


Author(s):  
Hiroyuki Tsuritani ◽  
Toshihiko Sayama ◽  
Yoshiyuki Okamoto ◽  
Takeshi Takayanagi ◽  
Kentaro Uesugi ◽  
...  

The reliability and lifetime of micro-joints on printed circuit boards (PCBs) is significantly affected by fatigue processes, including fatigue crack initiation and propagation to failure. Accordingly, the industries producing electronic devices and components strongly desire the development of a new nondestructive inspection technology, which detects micro-cracks appearing as thermal fatigue fractures in these joints. Accordingly, the authors have demonstrated that the micro-cracks in the micro-solder joints can be observed using the SP-μCT synchrotron X-ray micro tomography system. However, in order for such solder joint micro-cracks to be observable by SP-μCT, the observation object must have a diameter of less than roughly 1 mm. In this investigation, we applied a synchrotron radiation X-ray laminography system to three-dimensionally and nondestructively evaluate the fatigue crack propagation process in flip chip solder micro-joints. X-ray laminography is a technique for nondestructively observing planar objects. The optical system developed for use in X-ray laminography was constructed to provide the rotation stage with a 20° tilt from the horizontally incident X-ray beam. For this reason, X-rays were sufficiently transmitted through the planar object, in all directions. The observed specimens had a flip chip structure, in which a 10.04 mm square LSI chip is connected to a 52.55 mm (length) × 30.0 mm (width) FR-4 substrate by 120 μm diameter Sn-3.0wt%Ag-0.5wt%Cu lead-free solder bumps. A thermal cycle test was carried out, and specimens were collected at fixed cycle numbers. The same solder joints were observed successively using the synchrotron radiation X-ray laminography system at beamline BL20XU at SPring-8, the largest synchrotron radiation facility in Japan. An X-ray beam energy of 29.0 keV was selected to obtain laminography images with high contrast among component. The obtained laminography images clearly show the evolution of cracks, voids, and the Ag3Sn phase due to the thermal cyclic loading of the solder joints. In addition, the surface area of the same fatigue cracks was also measured, to quantify the crack propagation process. However, the surface area change measured by laminography differed from the crack propagation results obtained by standard SP-μCT. This difference may be due to an inability to observe some micro-cracks, due to crack closure to beneath than the detection limit of synchrotron radiation X-ray laminography. Consequently, these results demonstrate the possibility that nondestructive observation of fatigue cracks in the solder bumps on a large size electronic substrate by synchrotron radiation X-ray laminography, although its detection ability for narrow cracks may be limited, compared to SP-μCT.


Author(s):  
Carlo Grilletto ◽  
Steve Hsiung ◽  
Andrew Komrowski ◽  
John Soopikian ◽  
Daniel J.D. Sullivan ◽  
...  

Abstract This paper describes a method to "non-destructively" inspect the bump side of an assembled flip-chip test die. The method is used in conjunction with a simple metal-connecting "modified daisy chain" die and makes use of the fact that polished silicon is transparent to infra-red (IR) light. The paper describes the technique, scope of detection and examples of failure mechanisms successfully identified. It includes an example of a shorting anomaly that was not detectable with the state of the art X-ray equipment, but was detected by an IR emission microscope. The anomalies, in many cases, have shown to be the cause of failure. Once this has been accomplished, then a reasonable deprocessing plan can be instituted to proceed with the failure analysis.


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