Effect of surface texturing processes on the performance of crystalline silicon solar cell

Solar Energy ◽  
2017 ◽  
Vol 147 ◽  
pp. 228-231 ◽  
Author(s):  
Khaldun A. Salman
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Surface Texturing ◽  
Crystalline Silicon Solar Cell ◽  
Effect Of Surface

Surface Texturing of Crystalline Silicon Solar Cell Using Silicon Nanowires

2013 ◽  
Vol 52 (9R) ◽  
pp. 092301 ◽  
Author(s):  
Kyeom Seon Do ◽  
Min Gu Kang ◽  
Je Jun Park ◽  
Gi Hwan Kang ◽  
Jae-Min Myoung ◽  
...  
Keyword(s):  
Solar Cell ◽  
Silicon Nanowires ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Surface Texturing ◽  
Crystalline Silicon Solar Cell

scholarly journals Surface Texturing and Anti-Reflection Coating of Multi-crystalline Silicon Solar Cell

2007 ◽  
Vol 40 (3) ◽  
pp. 138-143
Author(s):  
Seong-Uk Jun ◽  
Kyung-Muk Lim ◽  
Sock-Hwan Choi ◽  
Yung-Myung Hong ◽  
Kyung-Mox Cho
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Surface Texturing ◽  
Crystalline Silicon Solar Cell

Influence of surface texturing conditions on crystalline silicon solar cell performance

2013 ◽  
Vol 13 ◽  
pp. S34-S40 ◽  
Author(s):  
Hyunho Kim ◽  
Sungeun Park ◽  
Soo Min Kim ◽  
Seongtak Kim ◽  
Young Do Kim ◽  
...  
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Surface Texturing ◽  
Cell Performance ◽  
Crystalline Silicon Solar Cell ◽  
Solar Cell Performance

The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744101 ◽  
Author(s):  
Bitao Chen ◽  
Yingke Zhang ◽  
Qiuping Ouyang ◽  
Fei Chen ◽  
Xinghua Zhan ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Double Layers ◽  
Crystalline Silicon Solar Cell

SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell.

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