Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties

AbstractAluminum nitride (AlN) thin films were prepared by ion-beam assisted deposition method, and the influence of the nitrogen ion beam energy on their microstructure and mechanical properties was studied by changing the ion beam energy from 0.1 to 1.5 keV. Films prepared with a low-energy ion beam show a columnar structure, while films prepared with a high-energy ion beam show a granular structure. The film hardness is found to decrease with increasing nitrogen ion beam energy. It is also found that the film hardness does not change drastically after annealing in nitrogen atmosphere at 500 °C, yielding the residual stress relaxation. It is proposed that the film hardness is dependent on the film microstructure, which can be controlled with the nitrogen ion beam energy, rather than the residual stress in the films.

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Wear resistance of carbon nitride thin films formed by ion beam assisted deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01201-3 ◽

2000 ◽

Vol 376 (1-2) ◽

pp. 152-158 ◽

Cited By ~ 14

Author(s):

Toshiyuki Hayashi ◽

Akihito Matsumuro ◽

Mutsuo Muramatsu ◽

Masao Kohzaki ◽

Katsumi Yamaguchi

Keyword(s):

Thin Films ◽

Wear Resistance ◽

Carbon Nitride ◽

Ion Beam ◽

Ion Beam Assisted Deposition

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Mechanical properties of carbon nitride thin films prepared by ion beam assisted filtered cathodic vacuum arc deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(98)00757-9 ◽

1999 ◽

Vol 112 (1-3) ◽

pp. 140-145 ◽

Cited By ~ 14

Author(s):

C Spaeth ◽

M Kühn ◽

T Chudoba ◽

F Richter

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Carbon Nitride ◽

Ion Beam ◽

Vacuum Arc ◽

Vacuum Arc Deposition ◽

Filtered Cathodic Vacuum Arc ◽

Arc Deposition

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Effect of Substrate Materials on Mechanical Properties and Microstructure of Carbon Nitride Films Prepared by Ion-beam-assisted deposition

MRS Proceedings ◽

10.1557/proc-647-o11.8 ◽

2000 ◽

Vol 647 ◽

Author(s):

Hidenobu Ohta ◽

Akihito Matsumuro ◽

Yutaka Takahashi

Keyword(s):

Mechanical Properties ◽

Carbon Nitride ◽

Ion Beam ◽

Pure Titanium ◽

Carbon Layer ◽

Bearing Steel ◽

Cross Sectional ◽

Ion Beam Assisted Deposition ◽

Transmission Electron ◽

Aluminum Alloy 7075

AbstractCarbon nitride (C-N) thin films were prepared on several substrates by ion-beam-assisted deposition technique. In this experiment, carbon was evaporated by electron beam. Nitrogen and argon ion beams were bombarded simultaneously. Aluminum alloy (7075), high-carbon chrome bearing steel (SUJ2), pure titanium plates (99.5%) and Si(100) wafer were used as substrates. Here, mechanical properties, such as hardness, adhesion, friction coefficient and wear resistance were investigated. These results show the adhesion between the films and substrates were improved by formation of the carbon layer. The microstructure of the carbon nitride films were investigated by cross sectional high-resolution transmission electron microscopy (HRTEM).

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Ductility Enhancement and Mechanical Properties of Ibad Ceramic thin films

MRS Proceedings ◽

10.1557/proc-201-201 ◽

1990 ◽

Vol 201 ◽

Cited By ~ 1

Author(s):

J. K. Hirvonen ◽

T. G. Tetreault ◽

G. Parker ◽

C. J. McHargue

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Low Temperature ◽

Ion Beam ◽

Grain Structure ◽

Fine Grained ◽

Ceramic Thin Films ◽

Ion Beam Assisted Deposition ◽

Ceramic Films

AbstractThin ceramic films (A12O3 ZrO2, Si3N4, and BN) have been prepared by ion beam assisted deposition (IBAD) and their mechanical properties examined. The films exhibit extreme ductility and adhesion, with the former property possibly attributed to the very fine grained, quasi-amorphous grain structure noted for low temperature IBAD coatings.

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