Correlation of optical and microstructural properties of Gd2O3 thin films through phase-modulated ellipsometry and multi-mode atomic force microscopy

2002 ◽  
Vol 200 (1-4) ◽  
pp. 219-230 ◽  
Author(s):  
N.K Sahoo ◽  
M Senthilkumar ◽  
S Thakur ◽  
D Bhattacharyya
2014 ◽  
Vol 997 ◽  
pp. 379-382
Author(s):  
Jen Ching Huang ◽  
Fu Jen Cheng

In this paper, the nanomachining experiments on the SPR3001 photoresistor thin films were processing by contact mode atomic force microscopy (AFM). After the experiment, it can be found, in the nanomachining, the greater the indented distance along the Z-axis depth, carved out of the groove depth and groove width of nanoline is greater. The influences of cutting directions on line width and cutting depth during nanomachining were quite a few and the cutting situation was stable by lateral nanomachining. This article also successfully processed the regular hexagonal nanopattern, also proves the nanomachining ability of the AFM probe is good at nanoscale patterned on photoresistor thin films.


2003 ◽  
Vol 36 (23) ◽  
pp. 8717-8727 ◽  
Author(s):  
Peter Busch ◽  
Dorthe Posselt ◽  
Detlef-M. Smilgies ◽  
Bernd Rheinländer ◽  
Friedrich Kremer

2014 ◽  
Vol 5 ◽  
pp. 494-500 ◽  
Author(s):  
Valentina Pukhova ◽  
Francesco Banfi ◽  
Gabriele Ferrini

The instantaneous displacement, velocity and acceleration of a cantilever tip impacting onto a graphite surface are reconstructed. The total dissipated energy and the dissipated energy per cycle of each excited flexural mode during the tip interaction is retrieved. The tip dynamics evolution is studied by wavelet analysis techniques that have general relevance for multi-mode atomic force microscopy, in a regime where few cantilever oscillation cycles characterize the tip–sample interaction.


1999 ◽  
Vol 353 (1-2) ◽  
pp. 194-200 ◽  
Author(s):  
C. Coupeau ◽  
J.F. Naud ◽  
F. Cleymand ◽  
P. Goudeau ◽  
J. Grilhé

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