Influence of sputtering conditions on the structure and properties of Ti–Si–N thin films prepared by r.f.-reactive sputtering

2003 ◽  
Vol 174-175 ◽  
pp. 261-265 ◽  
Author(s):  
M. Nose ◽  
Y. Deguchi ◽  
T. Mae ◽  
E. Honbo ◽  
T. Nagae ◽  
...  
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Structure And Properties

Preparation of CdS Thin Films by Reactive Sputtering Method

Shinku ◽  
1974 ◽  
Vol 17 (1) ◽  
pp. 19-22 ◽  
Author(s):  
Hiroharu HIRABAYASHI ◽  
Minoru NOGAMI
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Cds Thin Films

Substrate bias effects during R-F sputtering of Y-Ba-Cu-O films

1990 ◽  
Vol 5 (4) ◽  
pp. 677-679 ◽  
Author(s):  
A. J. Drehman ◽  
M. W. Dumais
Keyword(s):  
Thin Films ◽  
Strontium Titanate ◽  
Reactive Sputtering ◽  
Negative Bias ◽  
Superconducting Thin Films ◽  
Substrate Bias ◽  
Composition Control ◽  
Zero Resistance

Y-Ba-Cu-O films were made by R-F diode sputtering using a single oxide target. It was found that if a small negative bias is applied to the substrate, the etching associated with reactive sputtering is significantly reduced. This results in better composition control and uniformity, which are quite important for the formation of superconducting thin films. Films deposited on strontium titanate, when annealed in oxygen, become superconducting with zero resistance at 89 K.

Correlation between structure and properties of Er2O3 nanocrystalline thin films

2008 ◽  
Vol 354 (19-25) ◽  
pp. 2853-2857 ◽  
Author(s):  
Maria M. Giangregorio ◽  
Alberto Sacchetti ◽  
Maria Losurdo ◽  
Pio Capezzuto ◽  
Giovanni Bruno
Keyword(s):  
Thin Films ◽  
Structure And Properties ◽  
Nanocrystalline Thin Films

Evaluation of ion conductivity of ZrO2 thin films prepared by reactive sputtering in O2, H2O, and H2O+H2O2 mixed gas

2012 ◽  
Vol 520 (16) ◽  
pp. 5137-5140 ◽  
Author(s):  
Ning Li ◽  
Yoshio Abe ◽  
Midori Kawamura ◽  
Kyung Ho Kim ◽  
Tsutomu Suzuki
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Ion Conductivity ◽  
Mixed Gas
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