scholarly journals In Situ TEM Study on the Growth Process of Amorphous Layer on SnO 2 Nanoparticle During Sodiation on Real Time Scale

2016 ◽  
Vol 22 (S3) ◽  
pp. 1366-1367 ◽  
Author(s):  
Jun Young Cheong ◽  
Joon Ha Chang ◽  
Jeong Yong Lee ◽  
Il-Doo Kim
Keyword(s):  
Real Time ◽  
Time Scale ◽  
Growth Process ◽  
Amorphous Layer ◽  
In Situ Tem ◽  
Real Time Scale

In-Situ Tem Study of Copper-Tin Intermetallic Formation

1993 ◽  
Vol 323 ◽  
Author(s):  
Yujing Wu ◽  
Elizabeth G. Jacobs ◽  
Cyrus Pouraghabagher ◽  
Russell F. Pinizzotto
Keyword(s):  
Thin Films ◽  
Real Time ◽  
Diffusion Barrier ◽  
Solder Joints ◽  
Effective Diffusion ◽  
Copper Substrate ◽  
In Situ Tem ◽  
Intermetallic Formation ◽  
Intermetallic Growth

AbstractThe formation and growth of Cu6Sn5 and Cu3Sn at the interface of Sn-Pb solder/copper substrate are factors which affect the solderability and reliability of electronic solder joints. The addition of particles such as Ni to eutectic Sn-Pb solder drastically affects the activation energies of formation for both intermetallics. This study was performed to understand the mechanisms of intermetallic formation and the effects of Ni on intermetallic growth. Cu/Sn and Cu/Sn/Ni thin films were deposited by evaporation and observed in the TEM in real time using a hot stage. The diffusion of Sn through Cu6Sn5 and Cu3Sn followed by reaction with Cu must occur for intermetallic formation and growth to take place. Ni is an effective diffusion barrier which prevents Sn from diffusing into Cu.

An in-situ TEM microreactor for real-time nanomorphology & physicochemical parameters interrelated characterization

Nano Today ◽  
2020 ◽  
Vol 35 ◽  
pp. 100932
Author(s):  
Wei Li ◽  
Ming Li ◽  
Xueqing Wang ◽  
Pengcheng Xu ◽  
Haitao Yu ◽  
...  
Keyword(s):  
Real Time ◽  
Physicochemical Parameters ◽  
In Situ Tem

Real-time x-ray scattering study of sputter-deposited LaNiO3 thin films on Si substrates

1999 ◽  
Vol 569 ◽  
Author(s):  
Hsin-Yi Lee ◽  
Chih-Hao Lee ◽  
Keng S. Liang ◽  
Tai-Bor Wu
Keyword(s):  
Thin Films ◽  
Real Time ◽  
Amorphous Film ◽  
Amorphous Layer ◽  
Sputtering Deposition ◽  
X Ray ◽  
Si Substrates ◽  
Plane Normal ◽  
Integrated Intensities

ABSTRACTReal-time x-ray reflectivity and diffraction measurements under in-situ sputtering deposition conditions were performed to study the crystallization behavior of LaNiO3thin films on Si substrate. We found that an amorphous layer of 60 Å was grown in the first 6 min of the deposition and subsequently a polycrystalline overlayer was developed as observed from the in-situ x-ray reflectivity curves and diffraction patterns. Polycrystalline columnar textures of (110) and (100) were grown on the top of this amorphous film. By comparing the integrated intensities of two Bragg peaks in the plane normal of x-ray diffraction, it was found that the ability of (100)-texturization enhanced with increasing film thickness over a certain critical value.

scholarly journals MHD simulation of flare situation above the active region AR 10365 in the real time scale.

2020 ◽  
Author(s):  
A.I. Podgorny ◽  
◽  
I.M. Podgorny ◽  
A.V. Borisenko ◽  
◽  
...  
Keyword(s):  
Magnetic Field ◽  
Active Region ◽  
Real Time ◽  
Time Scale ◽  
Rapid Change ◽  
Field Configuration ◽  
Mhd Simulation ◽  
The Real ◽  
Real Time Scale ◽  
The Magnetic Field

Since the configuration of the magnetic field in the corona, where solar flares appear, cannot be determined from observations, to study the flare situation, a numerical magnetohydrodynamic (MHD) simulation is carried out above the active region. MHD simulation performed in a greatly reduced (10 000 times) time scale permit to obtain results on the study of the solar flare mechanism, but the magnetic field configuration was distorted, especially near the photospheric boundary, due to the unnaturally rapid change in the field on the photosphere. For a more accurate study of the flare situation, MHD simulation in the real time scale was performed above the active region of AR 10365, which was made possible through the use of parallel calculations. The MHD simulation in the real scale of time above the AR 10365 during the first day of evolution showed the appearance of current density maxima with singular X-type line and plasma flow, which have to cause to the formation of a current sheet.

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