scholarly journals Generation of photoionized plasmas in the laboratory: Analogues to astrophysical sources

2019 ◽  
Vol 15 (S350) ◽  
pp. 321-325
Author(s):  
S. White ◽  
R. Irwin ◽  
R. Warwick ◽  
G. Sarri ◽  
G. F. Gribakin ◽  
...  

AbstractImplementation of a novel experimental approach using a bright source of narrowband x-ray emission has enabled the production of a photoionized argon plasma of relevance to astrophysical modelling codes such as Cloudy. We present results showing that the photoionization parameter ζ = 4πF/ne generated using the VULCAN laser was ≈ 50 erg cm s−1, higher than those obtained previously with more powerful facilities. Comparison of our argon emission-line spectra in the 4.15 - 4.25 Å range at varying initial gas pressures with predictions from the Cloudy code and a simple time-dependent code are also presented. Finally we briefly discuss how this proof-of-principle experiment may be scaled to larger facilities such as ORION to produce the closest laboratory analogue to a photoionized plasma.

2015 ◽  
Vol 48 (1) ◽  
pp. 79-84 ◽  
Author(s):  
Romain Moury ◽  
Klaus Hauschild ◽  
Wolfgang Kersten ◽  
Jan Ternieden ◽  
Michael Felderhoff ◽  
...  

Anin situdiffraction cell is presented which has been designed and constructed for in-house powder diffraction experiments under high gas pressures up to 30 MPa. For a proof of principle, thein situcell has been tested for several hydrogenation experiments under elevated pressures and temperatures. LaNi5was chosen as an example for hydrogenation, applying simultaneously 5.5 MPa H2pressure at a temperature of 423 K. For testing the high-pressure–temperature suitability of thein situcell, pressure–temperature experiments up to 14 MPa at 373 K were performed, studying the rehydrogenation of NaH and Al to NaAlH4. The experimental setup enables recording ofin situX-ray diffraction data on laboratory instruments with short data acquisition times at elevated hydrogen pressures and temperatures.


1991 ◽  
Vol 223 ◽  
Author(s):  
Neeta Agrawal ◽  
R. D. Tarey ◽  
K. L. Chopra

ABSTRACTArgon plasma exposure has been used to induce surface chemical modification of aluminium thin films, causing a drastic change in etch rate in standard HNO3/CH3COOH/H3PO4 etchant. The inhibition period was found to increase with power and Ar plasma exposure time. Auger electron and x-ray photoelectron spectroscopies have indicated formation of an aluminium fluoride (AlF3) surface layer due to fluorine contamination originating from the residue left in the plasma chamber during CF4 processing. The high etch selectivity between unexposed and argon plasma exposed regions has been exploited as a new technique for resistless patterning of aluminium.


1994 ◽  
Author(s):  
Ronnie Shepherd ◽  
Rex Booth ◽  
Dwight Price ◽  
Rosemary Walling ◽  
Richard More ◽  
...  

1981 ◽  
Vol 52 (2) ◽  
pp. 670-675 ◽  
Author(s):  
J. D. Perez ◽  
L. F. Chase ◽  
R. E. McDonald ◽  
L. Tannenwald ◽  
B. A. Watson
Keyword(s):  

2004 ◽  
Vol 13 (01) ◽  
pp. 97-101
Author(s):  
C. SCHMITT ◽  
B. JURADO ◽  
A. R. JUNGHANS ◽  
K.-H. SCHMIDT ◽  
J. BENLLIURE

Peripheral heavy-ion collisions at relativistic energy are proposed as a new experimental approach dedicated to nuclear dissipation studies and, in particular, to investigate transient effects which are responsible for the inhibition of fission at the beginning of the process. To extract reliable information from the data, an analytical approximation of the time-dependent fission decay width is used in connection with new experimental signatures of relaxation effects.


2007 ◽  
Vol 3 (1-2) ◽  
pp. 131-135 ◽  
Author(s):  
T. Kai ◽  
T. Kawamura ◽  
Y. Inubushi ◽  
H. Nishimura ◽  
T. Nakamura ◽  
...  

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