Quantum Confinement Effects and Electronic Properties of SnO2 Quantum Wires and Dots

2010 ◽  
Vol 114 (11) ◽  
pp. 4841-4845 ◽  
Author(s):  
Hui-Xiong Deng ◽  
Shu-Shen Li ◽  
Jingbo Li
2000 ◽  
Vol 61 (7) ◽  
pp. 4488-4491 ◽  
Author(s):  
E. Martinet ◽  
M.-A. Dupertuis ◽  
F. Reinhardt ◽  
G. Biasiol ◽  
E. Kapon ◽  
...  

1995 ◽  
Vol 52 (15) ◽  
pp. 11073-11088 ◽  
Author(s):  
M. Notomi ◽  
S. Nojima ◽  
M. Okamoto ◽  
H. Iwamura ◽  
T. Tamamura ◽  
...  

2008 ◽  
Vol 1145 ◽  
Author(s):  
Masakazu Ichikawa ◽  
Yoshiaki Nakamura ◽  
Alexander Shklyaev ◽  
Norohito Fujinoki

AbstractWe present a method to form semiconductor nanodots on Si substrates by using ultrathin Si oxide technology and the results on their opto-electronic properties. We can form ultra-small semiconductor nanodots with the size of ˜5nm and ultra-high density of ˜1012 cm−2 on Si surfaces covered with ultrathin SiO2 films of ˜0.3nm thickness. We focus on the Ge and GeSn nanodots on Si substrates and those embedded in Si films. These structures exhibit quantum confinement effects and intense luminescence in the energy region of about 0.8 eV.


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