Atomic scale characterization of HfO2∕Al2O3 thin films grown on nitrided and oxidized Si substrates
Keyword(s):
Keyword(s):
2014 ◽
Vol 6
(19)
◽
pp. 17018-17023
◽
Keyword(s):
2016 ◽
Vol 33
(7)
◽
pp. 419-437
◽
2012 ◽
Vol 14
(44)
◽
pp. 15593
◽