SiC/SiO2 interface-state generation by electron injection

1999 ◽  
Vol 85 (12) ◽  
pp. 8292-8298 ◽  
Author(s):  
V. V. Afanas’ev ◽  
A. Stesmans ◽  
M. Bassler ◽  
G. Pensl ◽  
M. J. Schulz ◽  
...  
1988 ◽  
Vol 27 (Part 2, No. 12) ◽  
pp. L2395-L2397 ◽  
Author(s):  
Naoki Yasuda ◽  
Hiroshi Nakamura ◽  
Kenji Taniguchi ◽  
Chihiro Hamaguchi ◽  
Masakazu Kakumu

2007 ◽  
Vol 91 (15) ◽  
pp. 153503 ◽  
Author(s):  
John Rozen ◽  
Sarit Dhar ◽  
S. T. Pantelides ◽  
L. C. Feldman ◽  
Sanwu Wang ◽  
...  

1992 ◽  
Vol 284 ◽  
Author(s):  
A. D. Marwick ◽  
D. A. Buchanan ◽  
D. J. Dimaria ◽  
Phil Saunders

ABSTRACTRedistribution of hydrogen caused by hot electron injection has been studied in large Al-gate capacitors using internal photemission followed by hydrogen depth profiling with the 15 N nuclear reaction. A large peak of hydrogen (∼ 1015 at /cm2) at the Al/SiO2 interface due to a hydrated layer on the surface of the SiO2 was found to act as a source of hydrogen during the photoinjection. A small fraction of the hydrogen released from this peak was found to be re-trapped near the Si/;SiO2 interface if a field of >1 MV/cm was applied to the SiO2 during the injection. Up to 2 × 1014 atoms/cm2 of hydrogen were found to be trapped at this interface for injected fluences up to 5 C/cm2. These results are discussed in terms of current models of interface state generation involving hydrogen.


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