Capacitively coupled plasma source operating in Xe/Ar mixtures

2005 ◽  
Vol 38 (2) ◽  
pp. 287-299 ◽  
Author(s):  
N Yu Babaeva ◽  
J K Lee ◽  
J W Shon
Keyword(s):  
Plasma Source ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

The possibility for a voltage measurement technique using paraelectric behavior of capacitively coupled plasmas

2012 ◽  
Vol 79 (5) ◽  
pp. 467-472
Author(s):  
K. T. A. L. BURM
Keyword(s):  
Measurement Technique ◽  
Line Intensity ◽  
Applied Voltage ◽  
Linear Relation ◽  
Argon Plasma ◽  
Optical Emission ◽  
Plasma Source ◽  
Voltage Measurement ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

AbstractAn argon plasma is created from a general capacitively coupled plasma source and monitored by optical emission spectroscopy. A relation between the line intensity and the applied voltage is obtained and discussed. The plasma shows paraelectric behavior. A linear relation exists between the electric capacity of the capacitively coupled plasma and the applied voltage. This linear relation can be used in a new voltage measurement technique in which the applied voltage can be calculated from the measured line intensity.

Frequency optimization for capacitively coupled plasma source

2005 ◽  
Vol 33 (2) ◽  
pp. 382-383 ◽  
Author(s):  
K. Bera ◽  
D. Hoffman ◽  
S. Shannon ◽  
G. Delgadino ◽  
Yan Ye
Keyword(s):  
Plasma Source ◽  
Capacitively Coupled ◽  
Frequency Optimization ◽  
Capacitively Coupled Plasma

Atmospheric pressure capacitively coupled plasma source for the direct analysis of non-conductive solid samples

1999 ◽  
Vol 14 (4) ◽  
pp. 541-545 ◽  
Author(s):  
Sorin D. Anghel ◽  
Tiberiu Frentiu ◽  
Emil A. Cordos ◽  
Alpar Simon ◽  
Adrian Popescu
Keyword(s):  
Atmospheric Pressure ◽  
Direct Analysis ◽  
Plasma Source ◽  
Solid Samples ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

scholarly journals Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy)

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 993
Author(s):  
Yong-Hyun Kim ◽  
Jong-Sik Kim ◽  
Dae-Chul Kim ◽  
Young-Woo Kim ◽  
Jong-Bae Park ◽  
...  
Keyword(s):  
Energy Distribution ◽  
Plasma Source ◽  
Diagnostic Tools ◽  
Plasma Process ◽  
Capacitively Coupled ◽  
Process Diagnosis ◽  
Mass Distributions ◽  
Process Gas ◽  
Self Bias ◽  
Capacitively Coupled Plasma

We constructed a capacitively coupled plasma (CCP) source and installed various diagnostic tools to perform process diagnosis using a plasma process gas (CxFy). We obtained the energy and mass distributions of the ions and radicals from Ar, C4F8/Ar, and C4F6/Ar plasmas. The energy distribution of the ions incident on the substrate was controlled using the self-bias voltage, and the ion energy was found to be inversely proportional to the mass. The measured species and density of the ions and radicals can help understand plasma process results as they provide information about the ions and radicals incident on the substrate.

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