Experimentally validated computations of simultaneous ion and fast neutral energy and angular distributions in a capacitively coupled plasma reactor

2020 ◽  
Vol 53 (43) ◽  
pp. 435209
Author(s):  
Rochan R Upadhyay ◽  
Kenta Suzuki ◽  
Laxminarayan L Raja ◽  
Peter L G Ventzek ◽  
Alok Ranjan
Keyword(s):  
Plasma Reactor ◽  
Angular Distributions ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma ◽  
Energy And Angular Distributions

Dust transport phenomena in a capacitively coupled plasma reactor

2001 ◽  
Vol 89 (1) ◽  
pp. 34-41 ◽  
Author(s):  
Heon Chang Kim ◽  
Vasilios I. Manousiouthakis
Keyword(s):  
Plasma Reactor ◽  
Transport Phenomena ◽  
Capacitively Coupled ◽  
Dust Transport ◽  
Capacitively Coupled Plasma

scholarly journals A technique for evaluating the RF voltage across the electrodes of a capacitively-coupled plasma reactor

2006 ◽  
Vol 36 (2) ◽  
pp. 177-182 ◽  
Author(s):  
V. Lisovskiy ◽  
J.-P. Booth ◽  
K. Landry ◽  
D. Douai ◽  
V. Cassagne ◽  
...  
Keyword(s):  
Plasma Reactor ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

Plasma-Profile Control Using External Circuit in a Capacitively Coupled Plasma Reactor

2010 ◽  
Vol 38 (11) ◽  
pp. 3241-3248 ◽  
Author(s):  
Kallol Bera ◽  
Shahid Rauf ◽  
Ajit Balakrishna ◽  
Ken Collins
Keyword(s):  
Plasma Reactor ◽  
External Circuit ◽  
Capacitively Coupled ◽  
Profile Control ◽  
Capacitively Coupled Plasma ◽  
Plasma Profile

scholarly journals Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 999
Author(s):  
Ho Jun Kim
Keyword(s):  
Deposition Rate ◽  
Complex Geometry ◽  
Plasma Reactor ◽  
Three Dimensional ◽  
Multiple Roles ◽  
Capacitively Coupled ◽  
Large Particles ◽  
Capacitively Coupled Plasma ◽  
Physical Phenomena ◽  
Number Of Particles

Increasing the productivity of a showerhead-type capacitively coupled plasma (CCP) reactor requires an in-depth understanding of various physical phenomena related to the showerhead, which is not only responsible for gas distribution, but also acts as the electrode. Thus, we investigated how to enhance the cleanliness and deposition rate by studying the multiple roles of the showerhead electrode in a CCP reactor. We analyzed the gas transport in a three-dimensional complex geometry, and the SiH4/He discharges were simulated in a two-dimensional simplified geometry. The process volume was installed between the showerhead electrode (radio frequency powered) and the heater electrode (grounded). Our aim of research was to determine the extent to which the heated showerhead contributed to increasing the deposition rate and to reducing the size of the large particles generated during processing. The temperature of the showerhead was increased to experimentally measure the number of particles transported onto the heater to demonstrate the effects thereof on the decrease in contamination. The number of particles larger than 45 nm decreased by approximately 93% when the showerhead temperature increased from 373 to 553 K.

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