Point defects in pure amorphous silicon and their role in structural relaxation: A tight-binding molecular-dynamics study

2008 ◽  
Vol 77 (15) ◽  
Author(s):  
Xavier Urli ◽  
Cristiano L. Dias ◽  
Laurent J. Lewis ◽  
Sjoerd Roorda
1995 ◽  
Vol 396 ◽  
Author(s):  
M. tang ◽  
L. colombo ◽  
T. Diaz De La Rubia

AbstractTight-binding molecular dynamics (TBMD) simulations are performed (i) to evaluate the formation and binding energies of point defects and defect clusters, (ii) to compute the diffusivity of self-interstitial and vacancy in crystalline silicon, and (iii) to characterize the diffusion path and mechanism at the atomistic level. In addition, the interaction between individual defects and their clustering is investigated.


2002 ◽  
Vol 14 (41) ◽  
pp. 9535-9553 ◽  
Author(s):  
M Iannuzzi ◽  
P Raiteri ◽  
M Celino ◽  
L Miglio

1999 ◽  
Vol 59 (4) ◽  
pp. 2713-2721 ◽  
Author(s):  
Eunja Kim ◽  
Young Hee Lee ◽  
Changfeng Chen ◽  
Tao Pang

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