Deep UV exposure of Ag2Se/GeSe2utilizing an excimer laser

1984 ◽  
Vol 5 (1) ◽  
pp. 24-26 ◽  
Author(s):  
K.J. Polasko ◽  
D.J. Ehrlich ◽  
J.Y. Tsao ◽  
R.F.W. Pease ◽  
E.E. Marinero
Keyword(s):  
Excimer Laser ◽  
Uv Exposure ◽  
Deep Uv

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System

scholarly journals o-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography

1989 ◽  
Vol 21 (8) ◽  
pp. 603-607 ◽  
Author(s):  
Masayuki Endo ◽  
Yoshiyuki Tani ◽  
Masaru Sasago ◽  
Noboru Nomura
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Deep Uv ◽  
Krf Excimer Laser

scholarly journals Reduction of polymer residue on wet–transferred CVD graphene surface by deep UV exposure

2017 ◽  
Vol 110 (18) ◽  
pp. 183103 ◽  
Author(s):  
A. Suhail ◽  
K. Islam ◽  
B. Li ◽  
D. Jenkins ◽  
G. Pan
Keyword(s):  
Uv Exposure ◽  
Graphene Surface ◽  
Cvd Graphene ◽  
Deep Uv

Novel positive deep UV resist for KrF excimer laser lithography

1989 ◽  
Vol 29 (13) ◽  
pp. 859-862 ◽  
Author(s):  
Masayuki Endo ◽  
Yoshiyuki Tani ◽  
Masaru Sasago ◽  
Kazufumi Ogawa ◽  
Noboru Nomura
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Deep Uv ◽  
Krf Excimer Laser

scholarly journals An aqueous base developable novel deep-UV resist for KrF excimer laser lithography.

1991 ◽  
Vol 4 (3) ◽  
pp. 509-516 ◽  
Author(s):  
Makoto Murata ◽  
Eiichi Kobayashi ◽  
Yoshiji Yumoto ◽  
Takao Miura ◽  
Tsuguo Yamaoka
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Aqueous Base ◽  
Deep Uv ◽  
Krf Excimer Laser

Analysis of Horizontal-Vertical Patterning Asymmetry in a Linearly Polarized Deep UV Exposure System

1998 ◽  
Vol 37 (Part 1, No. 1) ◽  
pp. 364-368 ◽  
Author(s):  
Chang-Moon Lim ◽  
Hyeong-Soo Kim ◽  
Ki-Ho Baik
Keyword(s):  
Uv Exposure ◽  
Exposure System ◽  
Linearly Polarized ◽  
Deep Uv

Deep uv submicron lithography by using a pulsed high‐power excimer laser

1982 ◽  
Vol 53 (9) ◽  
pp. 6489-6490 ◽  
Author(s):  
Y. Kawamura ◽  
K. Toyoda ◽  
S. Namba
Keyword(s):  
Excimer Laser ◽  
High Power ◽  
Deep Uv

scholarly journals New phase-shifting technique for deep UV excimer laser based lithography

1995 ◽  
Author(s):  
Zsolt Bor ◽  
Joseph R. Cavallaro ◽  
Miklos Erdelyi ◽  
Motoi Kido ◽  
Chaitali Sengupta ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Phase Shifting ◽  
Phase Shifting Technique ◽  
Deep Uv ◽  
New Phase
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