Characterization and modeling of the trench surface inversion problem for the trench isolated CMOS technology

1983 ◽  
Author(s):  
K.M. Cham ◽  
Shang-yi Chiang ◽  
D. Wenocur ◽  
R.D. Rung
Keyword(s):  
Cmos Technology ◽  
Inversion Problem ◽  
Surface Inversion

The Surface Inversion Problem in Trench Isolated CMOS

1986 ◽  
pp. 199-216
Author(s):  
Kit Man Cham ◽  
Soo-Young Oh ◽  
Daeje Chin ◽  
John L. Moll
Keyword(s):  
Inversion Problem ◽  
Surface Inversion

The Surface Inversion Problem in Trench Isolated CMOS

1988 ◽  
pp. 233-250
Author(s):  
Kit Man Cham ◽  
Soo-Young Oh ◽  
John L. Moll ◽  
Keunmyung Lee ◽  
Paul Vande Voorde ◽  
...  
Keyword(s):  
Inversion Problem ◽  
Surface Inversion

CMOS TECHNOLOGY FOR CCD VIDEO MEMORIES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-41-C4-44
Author(s):  
G. J.T. DAVIDS ◽  
P. B. HARTOG ◽  
J. W. SLOTBOOM ◽  
G. STREUTKER ◽  
A. G. van der SIJDE ◽  
...  
Keyword(s):  
Cmos Technology

CMOS-TECHNOLOGY - STATUS, TRENDS AND APPLICATIONS

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-13-C4-22
Author(s):  
F. NEPPL ◽  
H.-J. PFLEIDERER
Keyword(s):  
Cmos Technology

CMOS TECHNOLOGY USING PLASMA NITRIDED OXIDE AS A GATE DIELECTRIC

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-421-C4-424 ◽  
Author(s):  
A. STRABONI ◽  
M. BERENGUER ◽  
B. VUILLERMOZ ◽  
P. DEBENEST ◽  
A. VERNA ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Cmos Technology
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