Experimental evidences of quantum-mechanical effects on low-field mobility, gate-channel capacitance, and threshold voltage of ultrathin body SOI MOSFETs

Author(s):  
K. Uchida ◽  
J. Koga ◽  
R. Ohba ◽  
T. Numata ◽  
S.I. Takagi
2008 ◽  
Vol 48 (1) ◽  
pp. 23-28
Author(s):  
J.P. Xu ◽  
Y.P. Li ◽  
P.T. Lai ◽  
W.B. Chen ◽  
S.G. Xu ◽  
...  

2013 ◽  
Vol 8 (2) ◽  
pp. 71-77
Author(s):  
Eddy Simoen ◽  
Maria G. C. Andrade ◽  
Luciano M. Almeida ◽  
M. Aoulaiche ◽  
C. Caillat ◽  
...  

The variability of the low-frequency (LF) noise in n-channel MOSFETs fabricated on an Ultra-Thin Buried Oxide (UTBOX) Silicon-on-Insulator (SOI) substrate has been studied and compared with the variability in the threshold voltage and low-field mobility of the same devices. No correlation has been found between the noise magnitude and the DC parameters, suggesting that the traps responsible for the current fluctuations do not affect the latter. A possible explanation is that the LF noise is dominated by Generation-Recombination (GR) centers in the silicon film, which have less impact on the drain current.


1993 ◽  
Vol 14 (12) ◽  
pp. 569-571 ◽  
Author(s):  
Y. Omura ◽  
S. Horiguchi ◽  
M. Tabe ◽  
K. Kishi

2006 ◽  
Vol 55 (7) ◽  
pp. 3670
Author(s):  
Li Yan-Ping ◽  
Xu Jing-Ping ◽  
Chen Wei-Bing ◽  
Xu Sheng-Guo ◽  
Ji Feng

1997 ◽  
Vol 18 (5) ◽  
pp. 206-208 ◽  
Author(s):  
G. Chindalore ◽  
S.A. Hareland ◽  
S.A. Jallepalli ◽  
A.F. Tasch ◽  
C.M. Maziar ◽  
...  

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