A 45nm low power system-on-chip technology with dual gate (logic and I/O) high-k/metal gate strained silicon transistors

Author(s):  
C.-H. Jan ◽  
P. Bai ◽  
S. Biswas ◽  
M. Buehler ◽  
Z.-P. Chen ◽  
...  
2004 ◽  
Vol 151 (1) ◽  
pp. 2 ◽  
Author(s):  
L. Bisdounis ◽  
C. Dre ◽  
S. Blionas ◽  
D. Metafas ◽  
A. Tatsaki ◽  
...  

Author(s):  
Matthias Eireiner ◽  
Doris Schmitt-Landsiedel ◽  
Paul Wallner ◽  
Andreas Schone ◽  
Stephan Henzler ◽  
...  

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