Full Custom MEMS Design: 2.5D Fabrication-Process Simulation for 3D Field-Solver-Based Circuit Extraction

2019 ◽  
Vol 19 (14) ◽  
pp. 5710-5717 ◽  
Author(s):  
Axel Hald ◽  
Hartmut Marquardt ◽  
Pekka Herzogenrath ◽  
Jurgen Scheible ◽  
Jens Lienig ◽  
...  
Keyword(s):  
Process Simulation ◽  
Fabrication Process ◽  
Circuit Extraction

scholarly journals Optimisation and Simulation of an Alternative nano-flash Memory: the SASEM device.

2004 ◽  
Vol 830 ◽  
Author(s):  
C. Krzeminski ◽  
E. Dubois ◽  
X. Tang ◽  
N. Reckinger ◽  
A. Crahay ◽  
...  
Keyword(s):  
Process Simulation ◽  
Flash Memory ◽  
Fabrication Process ◽  
Oxidation Temperature

ABSTRACTProcess simulation are performed in order to simulate the full fabrication process of an alternative nano-flash memory in order to optimise it and to improve the understanding of the dot storage formation. The influence of various parameters (oxidation temperature, nanowire shape) have been investigated.

Fabrication process simulation and reliability improvement of high-brightness LEDs

2009 ◽  
Vol 49 (9-11) ◽  
pp. 1244-1249 ◽  
Author(s):  
Tsung-Lin Chou ◽  
Chien-Fu Huang ◽  
Cheng-Nan Han ◽  
Shin-Yueh Yang ◽  
Kuo-Ning Chiang
Keyword(s):  
Process Simulation ◽  
Fabrication Process ◽  
High Brightness ◽  
Reliability Improvement

Fabrication, process simulation and testing of a thick CFRP component using the RTM process

2014 ◽  
Vol 56 ◽  
pp. 673-680 ◽  
Author(s):  
E. Poodts ◽  
G. Minak ◽  
L. Mazzocchetti ◽  
L. Giorgini
Keyword(s):  
Process Simulation ◽  
Fabrication Process ◽  
Rtm Process

Linewidth measurement using the low voltage SEM

1986 ◽  
Vol 44 ◽  
pp. 652-653
Author(s):  
M.G. Rosenfield
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Integrated Circuits ◽  
Secondary Electron ◽  
Low Voltage ◽  
Fabrication Process ◽  
Critical Dimensions ◽  
Linewidth Measurement ◽  
Threshold Technique ◽  
Scanning Electron

Minimum feature sizes in experimental integrated circuits are approaching 0.5 μm and below. During the fabrication process it is usually necessary to be able to non-destructively measure the critical dimensions in resist and after the various process steps. This can be accomplished using the low voltage SEM. Submicron linewidth measurement is typically done by manually measuring the SEM micrographs. Since it is desirable to make as many measurements as possible in the shortest period of time, it is important that this technique be automated.Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary electron signal generated by that structure. Thus, it is important to understand how the actual dimension of the line being measured relates to the secondary electron signal. Since different features generate different signals, the same method of relating linewidth to signal cannot be used. For example, the peak to peak method may be used to accurately measure the linewidth of an isolated resist line; but, a threshold technique may be required for an isolated space in resist.

INTEGRATED FABRICATION PROCESS FOR SOLID OXIDE FUELCELLS USING HYBRID PLASMA SPRAYING

1997 ◽  
Vol 1 (1) ◽  
pp. 41-47 ◽  
Author(s):  
Noriyuki Nomoto ◽  
Yoshitomi Okazaki ◽  
Kenji Kuroda ◽  
Shunji Takenoiri ◽  
Toyonobu Yoshida
Keyword(s):  
Plasma Spraying ◽  
Solid Oxide ◽  
Fabrication Process ◽  
Hybrid Plasma

Educational Process Simulation with the Help of Training Systems

2000 ◽  
Vol 54 (8-9) ◽  
pp. 113-121
Author(s):  
Ivan Kuz'mich Lifanov ◽  
Elena Nikolaevna Ivanenko
Keyword(s):  
Process Simulation ◽  
Educational Process ◽  
Training Systems
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