Determination of optimum Al content in HA-Al2 O3 nanocomposites coatings prepared by electrophoretic deposition on titanium substrate

2017 ◽  
Vol 15 (4) ◽  
pp. 970-979 ◽  
Author(s):  
Nayereh Askari ◽  
Mardali Yousefpour ◽  
Masoud Rajabi
1984 ◽  
Vol 19 (1) ◽  
pp. K1-K3 ◽  
Author(s):  
H. Fichtner-Schmittler ◽  
U. Lohse ◽  
G. Engelhardt ◽  
V. Patzelová

1990 ◽  
Vol 41 (3) ◽  
pp. 325-326
Author(s):  
Hidehiko KOBAYASHI ◽  
Miyuki KATOH ◽  
Hiroyuki SHIMODA ◽  
Takashi MITAMURA ◽  
Yoichi KAMEGAYA

2010 ◽  
Vol 30 (7) ◽  
pp. 1043-1049 ◽  
Author(s):  
Yu Bai ◽  
Madhav Prasad Neupane ◽  
Il Song Park ◽  
Min Ho Lee ◽  
Tae Sung Bae ◽  
...  

2005 ◽  
Vol 284-286 ◽  
pp. 901-904 ◽  
Author(s):  
Chang Kuk You ◽  
Xian Wei Meng ◽  
Tae Yub Kwon ◽  
Yu Zhong Yang ◽  
J.L. Ong ◽  
...  

Electrophoretic deposition was used for HA coating on dental implants with different coating thickness. The HA coating thickness was examined in terms of applied voltage and time, and powder concentration in suspension. Nano-size HA and SiO2-CaO-P2O5-B2O3 bioglass powders were synthesized by sol-gel method. Polyvinyl alcohol (3 wt%) as a binder was resolved in ethyl alcohol, then, nano HA powder was dispersed ultrasonically in the mixture for 15 min and pH was adjusted with HNO3 for positive charging on particle. Titanium substrate was held on cathode and counter electrode was platinum. HA with 0.5 % and 0.03 % of powder concentration was deposited electrophoretically at 10~20 V for 1~20 minutes. The thickness of as-deposited HA layer decreased from nearly 80 µm (0.5 %, 20 V, 10 min) to 4~5 µm (0.03%, 10V, 1 min) as powder concentration, applied voltage and time decreased, respectively. The surface of HA coating layer deposited in lower powder concentration showed much more homogeneous and relatively dense morphology, in contrast, the surface in thick suspension became rough or porous and was easily spalled. In a co-deposition of HA and bioglass, co-deposited glass played an important role in increasing bonding strength between coating layer and substrate. It is believed that electrophoretic deposition method can be one of alternatives for relatively thin and easy HA coating.


1988 ◽  
Vol 184 (1-2) ◽  
pp. 49-61 ◽  
Author(s):  
Alberto Alberti ◽  
Glauco Gottardi
Keyword(s):  

Author(s):  
Badri Mainali ◽  
Francis Patrick Zamborini

Abstract The electrophoretic deposition (EPD) of citrate-stabilized Au nanoparticles (cit-Au NPs) occurs on indium tin oxide (ITO)-coated glass electrodes upon electrochemical oxidation of hydroquinone (HQ) due to the release of hydronium ions. Anodic stripping voltammetry (ASV) for Au oxidation allows the determination of the amount of Au NP deposition under a specific EPD potential and time. The binding of Cr3+ to the cit-Au NPs inhibits the EPD by inducing aggregation and/or reducing the negative charge, which could lower the effective NP concentration of the cit-Au NPs and/or lower the electrophoretic mobility. This lowers the Au oxidation charge in the ASV, which acts as an indirect signal for Cr3+. The binding of melamine to cit-Au NPs similarly leads to aggregation and/or lowers the negative charge, also resulting in reduction of the ASV Au oxidation peak. The decrease in Au oxidation charge measured by ASV increases linearly with increasing Cr3+ and melamine concentration. The limit of detection (LOD) for Cr3+ is 21.1 ppb and 16.0 ppb for 15.1 and 4.1 nm diameter cit-Au NPs, respectively. Improving the sensing conditions allows for as low as 1 ppb detection of Cr3+. The LOD for melamine is 45.7 ppb for 4.1 nm Au NPs.


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