Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

2002 ◽  
Vol 20 (6) ◽  
pp. 2829 ◽  
Author(s):  
Patrick Naulleau ◽  
Kenneth A. Goldberg ◽  
Erik H. Anderson ◽  
David Attwood ◽  
Phillip Batson ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Test Stand ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Advanced Light Source

Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic

2006 ◽  
Vol 42 (1) ◽  
pp. 44-50 ◽  
Author(s):  
P. Naulleau ◽  
K.A. Goldberg ◽  
J.P. Cain ◽  
E.H. Anderson ◽  
K.R. Dean ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Advanced Light Source

Laser-produced plasma light source for extreme ultraviolet lithography

2013 ◽  
Vol 6 (1) ◽  
pp. 20-33
Author(s):  
窦银萍 DOU Yin-ping ◽  
孙长凯 SUN Chang-kai ◽  
林景全 LIN Jing-quan
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography

2020 ◽  
Vol 13 (1) ◽  
pp. 28-42
Author(s):  
宗 楠 ZONG Nan ◽  
胡蔚敏 HU Wei-min ◽  
王志敏 WANG Zhi-min ◽  
王小军 WANG Xiao-jun ◽  
张申金 ZHANG Shen-jin ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Research Progress ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3707-3712 ◽  
Author(s):  
Hiroshi Komori ◽  
Georg Soumagne ◽  
Tamotsu Abe ◽  
Takashi Suganuma ◽  
Yousuke Imai ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Laser-produced-plasma light source development for extreme ultraviolet lithography

2003 ◽  
Vol 21 (6) ◽  
pp. 2843 ◽  
Author(s):  
Hiroshi Komori ◽  
Tamotsu Abe ◽  
Takashi Suganuma ◽  
Yousuke Imai ◽  
Yukihiko Sugimoto ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

scholarly journals Wafer and reticle positioning system for the extreme ultraviolet lithography engineering test stand

2000 ◽  
Author(s):  
John B. Wronosky ◽  
Tony G. Smith ◽  
Marcus J. Craig ◽  
Beverly R. Sturgis ◽  
Joel R. Darnold ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Test Stand ◽  
Positioning System ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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