High-voltage metal-insulator-metal capacitor based on crystalline HfAlOxfilm grown by atomic layer deposition
2019 ◽
Vol 37
(1)
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pp. 011209
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2011 ◽
Vol 29
(1)
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pp. 01AC04
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2019 ◽
Vol 37
(5)
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pp. 050903
Keyword(s):
2015 ◽
Vol 55
(1)
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pp. 016502
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2011 ◽
Vol 29
(1)
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pp. 01AC09
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2007 ◽
Vol 50
(6)
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pp. 1865
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