High resolution patterning with Ag2S/As2S3 inorganic electron-beam resist and reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.582755 ◽

1983 ◽

Vol 1 (4) ◽

pp. 1174 ◽

Author(s):

B. Singh

Keyword(s):

Electron Beam ◽

High Resolution ◽

Reactive Ion Etching ◽

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X-ray zone plates fabricated using electron beam lithography and reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583242 ◽

1985 ◽

Vol 3 (1) ◽

pp. 265 ◽

Author(s):

H. Aritome

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

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Fabrication of micro-array of Fresnel rings on Si by electron beam lithography and reactive ion etching

Applied Physics A ◽

10.1007/s00339-016-9649-y ◽

2016 ◽

Vol 122 (2) ◽

Author(s):

Nura Liman Chiromawa ◽

Kamarulazizi Ibrahim

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Reactive Ion Etching ◽

Ion Etching ◽

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Ultramicro fabrications on Fe-Ni alloy films using electron-beam writing and reactive-ion etching (abstract)

Journal of Applied Physics ◽

10.1063/1.361575 ◽

1996 ◽

Vol 79 (8) ◽

pp. 5067

Author(s):

I. Nakatani

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

Ion Etching ◽

Alloy Films ◽

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Fabrication of silicon nanopillar arrays by electron beam lithography and reactive ion etching for advanced bacterial adhesion studies

Materials Research Express ◽

10.1088/2053-1591/ab0a16 ◽

2019 ◽

Vol 6 (6) ◽

pp. 065402 ◽

Author(s):

P W Doll ◽

A Al-Ahmad ◽

A Bacher ◽

A Muslija ◽

R Thelen ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Bacterial Adhesion ◽

Reactive Ion Etching ◽

Ion Etching ◽

Nanopillar Arrays

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High-resolution reactive ion etching and damage effects in the Si/GexSi1−x system

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586461 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2224 ◽

Author(s):

R. Cheung

Keyword(s):

High Resolution ◽

Reactive Ion Etching ◽

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Increased pattern transfer fidelity of ZEP 520A during reactive ion etching through chemical modifications by additional dosing of the electron beam resist

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3562272 ◽

2011 ◽

Vol 29 (2) ◽

pp. 021601 ◽

Author(s):

David A. Czaplewski ◽

Leonidas E. Ocola

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

Pattern Transfer ◽

Chemical Modifications ◽

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50−nm silicon structures fabricated with trilevel electron beam resist and reactive‐ion etching

Applied Physics Letters ◽

10.1063/1.92668 ◽

1981 ◽

Vol 39 (3) ◽

pp. 268-270 ◽

Author(s):

L. D. Jackel ◽

R. E. Howard ◽

E. L. Hu ◽

D. M. Tennant ◽

P. Grabbe

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

Ion Etching ◽

Silicon Structures

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Nanosilicon dot arrays with a bit pitch and a track pitch of 25nm formed by electron-beam drawing and reactive ion etching for 1Tbit∕in.2 storage

Applied Physics Letters ◽

10.1063/1.2400102 ◽

2006 ◽

Vol 89 (22) ◽

pp. 223131 ◽

Author(s):

Sumio Hosaka ◽

Hirotaka Sano ◽

Masumi Shirai ◽

Hayato Sone

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

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High-resolution depth monitoring of reactive ion etching of InP/InGaAs(P) MQWs using reflectance measurements

Semiconductor Science and Technology ◽

10.1088/0268-1242/11/6/021 ◽

1996 ◽

Vol 11 (6) ◽

pp. 968-973 ◽

Author(s):

A Stano ◽

C Coriasso ◽

G Meneghini

Keyword(s):

High Resolution ◽

Reactive Ion Etching ◽

Ion Etching ◽

Reflectance Measurements

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Ion and electron beam deposited masks for pattern transfer by reactive ion etching

Microelectronic Engineering ◽

10.1016/j.mee.2011.02.053 ◽

2011 ◽

Vol 88 (8) ◽

pp. 2710-2713 ◽

Author(s):

A. Notargiacomo ◽

E. Giovine ◽

L. Di Gaspare

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

Pattern Transfer ◽

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