Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance

2021 ◽  
Vol 39 (3) ◽  
pp. 032416
Author(s):  
Taguhi Yeghoyan ◽  
Vincent Pesce ◽  
Moustapha Jaffal ◽  
Gauthier Lefevre ◽  
Rémy Gassilloud ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ion Bombardment ◽  
Selective Deposition ◽  
Layer Deposition

scholarly journals Low temperature temporal and spatial atomic layer deposition of TiO2 films

2015 ◽  
Vol 33 (4) ◽  
pp. 041512 ◽  
Author(s):  
Morteza Aghaee ◽  
Philipp S. Maydannik ◽  
Petri Johansson ◽  
Jurkka Kuusipalo ◽  
Mariadriana Creatore ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Layer Deposition ◽  
Temporal And Spatial

Low Temperature Epitaxial Oxide Ultrathin Films and Nanostructures by Atomic Layer Deposition

2012 ◽  
Vol 24 (19) ◽  
pp. 3732-3737 ◽  
Author(s):  
Mariona Coll ◽  
Jaume Gazquez ◽  
Anna Palau ◽  
Maria Varela ◽  
Xavier Obradors ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Epitaxial Oxide

Hysteresis-free HfO2 film grown by atomic layer deposition at low temperature

2011 ◽  
Vol 519 (22) ◽  
pp. 7723-7726 ◽  
Author(s):  
J. Shen ◽  
C.Y. Zhang ◽  
T.T. Xu ◽  
A.N. Jiang ◽  
Z.Y. Zhang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Hfo2 Film ◽  
Layer Deposition

Facile rearrangement of molecular layer deposited metalcone thin films by electron beam irradiation for area selective atomic layer deposition

2021 ◽  
Author(s):  
Seunghwan Lee ◽  
GeonHo Baek ◽  
Hye-mi Kim ◽  
Yong-Hwan Kim ◽  
Jin-Seong Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Electron Beam Irradiation ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Beam Irradiation ◽  
Selective Deposition ◽  
Layer Deposition ◽  
Amorphous Structures

Metalcone films can be rearranged from amorphous structures to 2D-like carbon by electron beam irradiation. The irradiated indicone (HQ) film can be used as an inhibitor for selective deposition delaying 20 cycles of ALD of ZnO.

A Selective BP/Si Contact Formed by Low-Temperature Plasma-Enhanced Atomic Layer Deposition

2021 ◽  
Vol 47 (1) ◽  
pp. 96-98
Author(s):  
A. S. Gudovskikh ◽  
D. A. Kudryashov ◽  
A. I. Baranov ◽  
A. V. Uvarov ◽  
I. A. Morozov
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Layer Deposition
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