Nanometer-scale etching of copper thin films in high-density plasma of an ethylenediamine/acetic acid/argon gas mixture
2022 ◽
Vol 40
(1)
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pp. 010604
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2018 ◽
Vol 18
(9)
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pp. 968-974
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2003 ◽
Vol 20
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pp. 1138-1141
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2004 ◽
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pp. G5
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2015 ◽
Vol 66
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pp. 212-218
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2010 ◽
Vol 8
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pp. 012017
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