Rigorous electromagnetic field mask modeling and related lithographic effects in the low k1 and ultrahigh numerical aperture regime
2007 ◽
Vol 6
(3)
◽
pp. 031002
◽
2021 ◽
1982 ◽
Vol 40
◽
pp. 182-185
Keyword(s):
1989 ◽
Vol 47
◽
pp. 364-365
1990 ◽
Vol 48
(1)
◽
pp. 354-355
Keyword(s):
1966 ◽
Vol 113
(1)
◽
pp. 35
◽