Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system

2002 ◽  
Author(s):  
Harry Sewell ◽  
Pankaj Raval ◽  
Diane C. McCafferty
Keyword(s):  
Phase Shift ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Resolution Limits ◽  
Phase Shift Mask ◽  
Very High

Optimal phase shift and reflectance for high numerical aperture EUV phase shift mask

2021 ◽  
Author(s):  
Inhwa Kang ◽  
Jang-Gun Park ◽  
Minwoo Kim ◽  
Jun-Hyeong Lee ◽  
Hye-Keun Oh
Keyword(s):  
Phase Shift ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Phase Shift Mask

scholarly journals Very High Numerical Aperture Fibers

2004 ◽  
Vol 16 (3) ◽  
pp. 843-845 ◽  
Author(s):  
W.J. Wadsworth ◽  
R.M. Percival ◽  
G. Bouwmans ◽  
J.C. Knight ◽  
T.A. Birks ◽  
...  
Keyword(s):  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Very High
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