VLSI-COMPATIBLE PROCESSING AND LOW-VOLTAGE OPERATION OF MULTIEMITTER Si/SiGe HETEROJUNCTION BIPOLAR TRANSISTORS

2000 ◽  
Vol 10 (01) ◽  
pp. 75-81 ◽  
Author(s):  
A. ZASLAVSKY ◽  
M. MASTRAPASQUA ◽  
C. A. KING ◽  
R. W. JOHNSON ◽  
R. PILLARISETTY ◽  
...  
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Low Voltage ◽  
Bipolar Transistors ◽  
Current Gain ◽  
Operating Voltage ◽  
New Class ◽  
Low Voltage Operation ◽  
Contact Symmetry ◽  
Current Flows ◽  
Exclusive Or

Previously we demonstrated a new class of VLSI-compatible multiemitter Si/SiGe/Si npn HBTs with enhanced logic functionality. These devices have two (or more) emitter contacts and no base contact. Given a potential difference between any two emitter contacts, one of the emitter-base junctions is forward biased and injects electrons into the base, while the other junction is reverse biased and small controlling current flows by interband tunneling. Because of emitter contact symmetry, the device possesses exclusive or functionality. Our first devices provided current gain of ~400 at room temperature, at an operating voltage of ~2 V. Here we present an improved version that operates at 1 V, as well as a multiemitter HBT fabrication sequence that is not only fully compatible with a VLSI BiCMOS process, but even saves several processing steps comapred to a standard HBT.

Current gain increase in AlGaAs/GaAs heterojunction bipolar transistors using AlGaAs layer overgrowth

1994 ◽  
Vol 65 (11) ◽  
pp. 1403-1405 ◽  
Author(s):  
S. R. D. Kalingamudali ◽  
A. C. Wismayer ◽  
R. C. Woods ◽  
J. S. Roberts
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors ◽  
Current Gain ◽  
Algaas Layer

Prevention of InP/InGaAs/InP Double Heterojunction Bipolar Transistors from Current Gain Reduction during Passivation

2004 ◽  
Vol 833 ◽  
Author(s):  
Byoung-Gue Min ◽  
Jong-Min Lee ◽  
Seong-Il Kim ◽  
Chul-Won Ju ◽  
Kyung-Ho Lee
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Silicon Oxide ◽  
Surface Recombination ◽  
Surface States ◽  
Bipolar Transistors ◽  
Base Layer ◽  
Current Gain ◽  
Device Structure ◽  
Double Heterojunction ◽  
Gain Reduction

ABSTRACTA significant degradation of current gain of InP/InGaAs/InP double heterojunction bipolar transistors was observed after passivation. The amount of degradation depended on the degree of surface exposure of the p-type InGaAs base layer according to the epi-structure and device structure. The deposition conditions such as deposition temperature, kinds of materials (silicon oxide, silicon nitride and aluminum oxide) and film thickness were not major variables to affect the device performance. The gain reduction was prevented by the BOE treatment before the passivation. A possible explanation of this behavior is that unstable non-stoichiometric surface states produced by excess In, Ga, or As after mesa etching are eliminated by BOE treatment and reduce the surface recombination sites.

Improvement of current gain of C-doped GaAsSb-base heterojunction bipolar transistors by using an InAlP emitter

2005 ◽  
Vol 87 (2) ◽  
pp. 023503 ◽  
Author(s):  
Yasuhiro Oda ◽  
Haruki Yokoyama ◽  
Kenji Kurishima ◽  
Takashi Kobayashi ◽  
Noriyuki Watanabe ◽  
...  
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors ◽  
Current Gain
Sign in / Sign up

Export Citation Format

Share Document