COMPOSITES OF THE TITANIA THIN FILMS IMPLANTED BY Ge AND Si

By using reactive magnetron sputtering system, titanium dioxide thin films were fabricated onto quartz substrate, and then modified by Ge and Si atoms that were introduced with ion implantation method. XRD, AFM, XPS, and UV-vis were used to characterize these films, and X-ray photoelectron spectroscopy (XPS) was adopted to examine the atomic chemical states of implanted titanium dioxide thin films. The results show that there are Ge and silicon oxides precipitations in TiO 2 matrices. The implanted Ge + Si thin film exhibits an intense absorption band within visible region, which will further benefit its practical applications.

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Titanium Dioxide Thin Films: Effect of Annealed in Oxygen Ambient

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.364.12 ◽

2011 ◽

Vol 364 ◽

pp. 12-15 ◽

Cited By ~ 1

Author(s):

Mohd Nor Asiah ◽

M.F. Achoi ◽

Saifollah Abdullah ◽

Mohamad Rusop

Keyword(s):

Thin Films ◽

Titanium Dioxide ◽

Spin Coating ◽

Quartz Substrate ◽

Visible Region ◽

Transmission Spectra ◽

Atomic Force ◽

Average Transmittance ◽

Coating Method ◽

Titanium Dioxide Thin Films

Titanium dioxide (TiO2) thin films deposited on quartz substrate by spin-coating method using titanium (IV) butoxide has been studied. The aim of this paper is to investigate the effect of annealing in oxygen ambient on the morphology and optical properties of thin films. The distinct variations in the morphology of the thin films were observed from atomic force microscope (AFM) images. The transmission spectra obtained from UV-VIS-NIR showed the TiO2thin films exhibited average transmittance value up to 80% in the visible region. Raman spectra of thin films annealed in O2shifted from 142 cm-1to 179 cm-1.

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Structural, Optical and Electrical Properties of Titanium Dioxide Thin Films with Different Molarity

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.667.58 ◽

2013 ◽

Vol 667 ◽

pp. 58-62 ◽

Cited By ~ 1

Author(s):

S.K.M. Maarof ◽

Saifollah Abdullah ◽

Mohamad Rusop Mahmood

Keyword(s):

Thin Films ◽

Titanium Dioxide ◽

Electrical Properties ◽

Sol Gel ◽

Visible Region ◽

Optical And Electrical Properties ◽

A Value ◽

Sol Gel Process ◽

Coating Method ◽

Titanium Dioxide Thin Films

Titanium dioxide, TiO2 is one of the semiconductor materials that can be produced in many ways, such as magnetron sputtering, CVD, and sol-gel process. This paper studied on the production of TiO2 by sol-gel method using titanium tetra (IV) isopropoxide, TTiP. The solution of TiO2 then deposited as a thin films onto glass substrate by spin-coating method. The purpose of this paper is to investigate the effect of molarity on the morphology, optical and electrical properties of the thin films. The effect on the morphology was observed by AFM. The electrical properties then observed by IV characteristic and finally on the optical properties were investigated by UV-Vis. The transmission obtained from UV-Vis showed that TiO2 thin films are decreased around 18% at higher molarity in a visible region. The bandgap also decrease at high molarity. Higher molarity of TiO2 in current-voltage characteristic gave a value of current density for 1.03×10-4 A/m2 and resistivity 1.95×107 Ωm.

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X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect

Science of Advanced Materials ◽

10.1166/sam.2016.2490 ◽

2016 ◽

Vol 8 (2) ◽

pp. 336-341 ◽

Cited By ~ 1

Author(s):

Woon-Seop Choi

Keyword(s):

Thin Films ◽

Titanium Dioxide ◽

Atomic Layer Deposition ◽

Photoelectron Spectroscopy ◽

Atomic Layer ◽

Annealing Effect ◽

X Ray ◽

Layer Deposition ◽

Titanium Dioxide Thin Films

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Surface Morphology and Structure Study of Titanium Dioxide Thin Films Deposited on PET Substrates

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.79-82.883 ◽

2009 ◽

Vol 79-82 ◽

pp. 883-886

Author(s):

Yu Hui Zhang ◽

Quan Ji ◽

Xi Hua Pei

Keyword(s):

Thin Films ◽

Titanium Dioxide ◽

Surface Morphology ◽

Photoelectron Spectroscopy ◽

Rf Magnetron Sputtering ◽

Structure Study ◽

Tio2 Thin Films ◽

X Ray ◽

Titanium Dioxide Thin Films ◽

Pet Substrate

Titanium dioxide (TiO2) thin films were deposited by rf magnetron sputtering, using a Ti target (purity 99.99%), on poly (ethylene terephthalate) (PET) substrate. Argon and oxygen were used as the working and reacting gas, respectively. The surface morphology was studied using scanning electron microscopy (SEM) and atomic force microscopy (AFM), and the film composition and structure by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). Uniform and compact TiO2 nanoparticles with diameter about 50 nm were deposited on PET substrates within 2 minutes. Many nano-sized particles aggregated and formed larger clusters after 5 minutes. The size of the clusters increased with increased sputtering time. The particles grew perpendicular to the substrate, and the surfaces of the films were smooth and undulate. The Ti2p peak was resolvable into the three valence species Ti4+, Ti3+ and Ti2+. The O/Ti ratio varied with the Ar: O2, ratio, the optimum value of which was in the range 4-8. The TiO2 films deposited on PET substrate were amorphous.

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