Thickness Dependence of Perpendicular Anisotropy in Nickel Films

1977 ◽  
Vol 16 (8) ◽  
pp. 1469-1470
Author(s):  
Yasuo Gondō ◽  
Hiroshi Konno ◽  
Isamu Sato ◽  
Akitsuna Yuhara
Keyword(s):  
Thickness Dependence ◽  
Perpendicular Anisotropy ◽  
Nickel Films

Dependence of Hysteresis Loops on Thickness of Thin Nickel Films Prepared by RF Sputtering

2011 ◽  
Vol 335-336 ◽  
pp. 1443-1447 ◽  
Author(s):  
Watcharee Rattanasakulthong ◽  
Pichai Sirisangsawang ◽  
Supree Pinitsoontorn ◽  
Chitnarong Sirisathitkul
Keyword(s):  
Rf Sputtering ◽  
Hysteresis Loops ◽  
Perpendicular Anisotropy ◽  
X Ray Diffraction ◽  
Saturation Field ◽  
X Ray ◽  
Nickel Films ◽  
Glass Substrates ◽  
Plane Anisotropy ◽  
Thin Nickel

Nickel films of varying thicknesses between 70 and 300 nm were deposited on glass substrates by RF sputtering and their broad (111) FCC peaks were identified by X-ray diffraction. The surface roughness and sub-micron grains were revealed by scanning electron microscopy. According to vibrating sample magnetometry, the films showed hysteresis loops with comparable coercive field and saturation field for the in-plane and perpendicular magnetizations. The increase in thickness substantially increased the magnetization and the squareness of the Ni films. The thickness can be classified into 2 regimes by the variation of squareness. The films are thinner than 200 nm showed the in-plane anisotropy whereas the perpendicular anisotropy was developed in the case of the thickness above 200 nm.

Compositional and Thickness Dependence of the Ferromagnetic Anisotropy in Resistance of Iron‐Nickel Films

1964 ◽  
Vol 35 (9) ◽  
pp. 2604-2608 ◽  
Author(s):  
E. N. Mitchell ◽  
H. B. Haukaas ◽  
H. D. Bale ◽  
J. B. Streeper
Keyword(s):  
Thickness Dependence ◽  
Nickel Films ◽  
Iron Nickel

Perpendicular Anisotropy in Electrodeposited Nickel Films

1968 ◽  
Vol 39 (1) ◽  
pp. 201-204 ◽  
Author(s):  
A. F. Mayadas ◽  
E. Klokholm
Keyword(s):  
Perpendicular Anisotropy ◽  
Nickel Films ◽  
Electrodeposited Nickel
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