Effect of Microwave Pulse on the Deposition Rate of Hydrogenated Amorphous Silicon in the Electron Cyclotron Resonance Plasma Deposition

Plasma Deposition ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Preparation of doped hydrogenated amorphous silicon films by microwave electron‐cyclotron‐resonance plasma discharge deposition

Journal of Applied Physics ◽

10.1063/1.338013 ◽

1987 ◽

Vol 61 (5) ◽

pp. 2084-2087 ◽

Cited By ~ 8

Author(s):

M. Kitagawa ◽

K. Setsune ◽

Y. Manabe ◽

T. Hirao

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.44-46.135 ◽

1995 ◽

Vol 44-46 ◽

pp. 135-180 ◽

Cited By ~ 5

Author(s):

M. Zhang ◽

Yukihiro Nakayama

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

Effect of Microwave Pulse on the Optical Properties of Hydrogenated Amorphous Silicon Thin Films Deposited by Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.6867 ◽

1997 ◽

Vol 36 (Part 1, No. 11) ◽

pp. 6867-6870

Author(s):

Ju-Hyeon Lee ◽

Il-Chae Jung ◽

Sang-Kook Park ◽

Cheong-A Baek ◽

Sung Park

Keyword(s):

Thin Films ◽

Optical Properties ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Microwave Pulse ◽

Silicon Thin Films ◽

Hydrogenated Amorphous ◽

RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition

10.1117/12.304500 ◽

1998 ◽

Author(s):

Yoshiyuki Hirano ◽

Fumio Sato ◽

Ahalapitiya H. Jayatissa ◽

Hiroshi Ohtake ◽

Kuniharu Takizawa

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Growth and characterization of hydrogenated amorphous silicon prepared using a combined hot wire and electron cyclotron resonance plasma deposition technique

10.31274/rtd-20200803-335 ◽

2003 ◽

Author(s):

Matthew Alan Ring

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Plasma Deposition ◽

Hot Wire ◽

Deposition Technique ◽

Hydrogenated Amorphous ◽

Low-Temperature Deposition of Hydrogenated Amorphous Silicon in an Electron Cyclotron Resonance Reactor for Flexible Displays

Proceedings of the IEEE ◽

10.1109/jproc.2005.851533 ◽

2005 ◽

Vol 93 (7) ◽

pp. 1364-1373 ◽

Cited By ~ 11

Author(s):

A.J. Flewitt ◽

W.I. Milne

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Flexible Displays ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Hydrogenated Amorphous

Low Temperature Preparation of Hydrogenated Amorphous Silicon by Microwave Electron-Cyclotron-Resonance Plasma CVD

Japanese Journal of Applied Physics ◽

10.1143/jjap.26.l231 ◽

1987 ◽

Vol 26 (Part 2, No. 4) ◽

pp. L231-L233 ◽

Cited By ~ 22

Author(s):

Masatoshi Kitagawa ◽

Shin-ichiro Ishihara ◽

Kentaro Setsune ◽

Yoshio Manabe ◽

Takashi Hirao

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Cyclotron Resonance ◽

Plasma Cvd ◽

Low Temperature Preparation ◽

Hydrogenated Amorphous ◽

Resonance Plasma ◽

Temperature Preparation

Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance

Thin Solid Films ◽

10.1016/j.tsf.2006.11.105 ◽

2007 ◽

Vol 515 (19) ◽

pp. 7650-7653 ◽

Cited By ~ 4

Author(s):

T.H. Dao ◽

M.E. Gueunier-Farret ◽

D. Daineka ◽

P. Bulkin ◽

P. Roca i Cabarrocas ◽

...

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Electronic Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Thermal Coupling ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

In situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing

Journal of Applied Physics ◽

10.1063/1.369242 ◽

1999 ◽

Vol 85 (2) ◽

pp. 1172-1177 ◽

Cited By ~ 23

Author(s):

Ryoichi Nozawa ◽

Hirohisa Takeda ◽

Masafumi Ito ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Hydrogen Plasma ◽

Silicon Surfaces ◽

In Situ Observation ◽

Hydrogenated Amorphous ◽

Plasma Annealing

On the microstructural, optical and mechanical properties of hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00288-5 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 752-755 ◽

Cited By ~ 15

Author(s):

O. Durand-Drouhin ◽

A. Zeinert ◽

M. Benlahsen ◽

K. Zellama ◽

R. Kré ◽

...

Keyword(s):

Mechanical Properties ◽

Amorphous Carbon ◽

Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Optical And Mechanical Properties ◽

Hydrogenated Amorphous ◽