90nm Node 1T Floating Gate Embedded Flash Memory with Precharge NMOS Transistor

Author(s):  
Padma Prasada ◽  
Sathisha ◽  
H. D. Ranjith
2008 ◽  
Vol 93 (21) ◽  
pp. 213503 ◽  
Author(s):  
Hung-Sheng Shih ◽  
Shang-Wei Fang ◽  
An-Chi Kang ◽  
Ya-Chin King ◽  
Chrong-Jung Lin

Author(s):  
M. Hoffmann ◽  
C. Nowak ◽  
A. Haase ◽  
S. Eckl

Abstract There are two known failure mechanisms that cause Gate Disturb failures in flash devices. One main electrically classified failure is the Gate Disturb failure. A second mechanism is the Floating Gate charging caused by high energetic electrons, so-called channel hot electrons, jumping above the energetic barrier of tunnel oxide. This paper describes the characterization of a single transistor Flash cell with the nano-probing approach and introduces a test algorithm to distinguish between these mechanisms at a Gate Disturb affected Flash cell. A Keithley parameter analyzer in combination with Atomic Force Probing (AFP) has been used for the Flash cell device characterization. A Gate Disturb defect can be induced by different defect mechanisms. Two of them, TRAP's in tunnel oxide and channel hot electrons as a result of leaky PN-junctions, were identified as the main root causes. These mechanisms can be distinguished by AFP-analysis with the tests presented in the paper.


Author(s):  
Jun Hirota ◽  
Ken Hoshino ◽  
Tsukasa Nakai ◽  
Kohei Yamasue ◽  
Yasuo Cho

Abstract In this paper, the authors report their successful attempt to acquire the scanning nonlinear dielectric microscopy (SNDM) signals around the floating gate and channel structures of the 3D Flash memory device, utilizing the custom-built SNDM tool with a super-sharp diamond tip. The report includes details of the SNDM measurement and process involved in sample preparation. With the super-sharp diamond tips with radius of less than 5 nm to achieve the supreme spatial resolution, the authors successfully obtained the SNDM signals of floating gate in high contrast to the background in the selected areas. They deduced the minimum spatial resolution and seized a clear evidence that the diffusion length differences of the n-type impurity among the channels are less than 21 nm. Thus, they concluded that SNDM is one of the most powerful analytical techniques to evaluate the carrier distribution in the superfine three dimensionally structured memory devices.


2021 ◽  
Vol 13 (1) ◽  
Author(s):  
Seongin Hong ◽  
Junwoo Park ◽  
Jung Joon Lee ◽  
Sunjong Lee ◽  
Kyungho Yun ◽  
...  

AbstractTwo-dimensional transition metal dichalcogenide materials (TMDs), such as molybdenum disulfide (MoS2), have been considered promising candidates for future electronic applications owing to their electrical, mechanical, and optical properties. Here, we present a new concept for multifunctional MoS2 flash memory by combining a MoS2 channel with a PEDOT:PSS floating layer. The proposed MoS2 memory devices exhibit a switching ratio as high as 2.3 × 107, a large memory window (54.6 ± 7.80 V), and high endurance (>1,000 cycles). As the PEDOT:PSS film enables a low-temperature solution-coating process and mechanical flexibility, the proposed P-memory can be embedded on a polyimide substrate over a rigid silicon substrate, offering high mechanical endurance (over 1,000 cycle bending test). Furthermore, both MoS2 and PEDOT:PSS have a bandgap that is desirable in optoelectronic memory operation, where charge carriers are stored differently in the floating gate depending on light illumination. As a new application that combines photodiodes and memory functions, we demonstrate multilevel memory programming based on light intensity and color.


2007 ◽  
Vol 28 (7) ◽  
pp. 622-624 ◽  
Author(s):  
Yan Li ◽  
Ru Huang ◽  
Yimao Cai ◽  
Falong Zhou ◽  
Xiaonan Shan ◽  
...  

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