Doped Silicon Oxide Deposition by Atmospheric Pressure and Low Temperature Chemical Vapor Deposition Using Tetraethoxysilane and Ozone

1991 ◽  
Vol 138 (10) ◽  
pp. 3019-3024 ◽  
Author(s):  
K. Fujino ◽  
Y. Nishimoto ◽  
N. Tokumasu ◽  
K. Maeda
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Doped Silicon ◽  
Oxide Deposition

Homoleptic Tin and Silicon Amido Compounds as Precursors for Low-Temperature Atmospheric Pressure Chemical Vapor Deposition of Tin and Silicon Oxide Thin Films

1994 ◽  
Vol 6 (4) ◽  
pp. 360-361 ◽  
Author(s):  
Lauren M. Atagi ◽  
David M. Hoffman ◽  
Jia-Rui Liu ◽  
Zongshuang Zheng ◽  
Wei-Kan Chu ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Oxide Thin Films ◽  
Pressure Chemical

Low-temperature atmospheric pressure chemical vapor deposition of titanium disulfide films

1992 ◽  
Vol 4 (6) ◽  
pp. 1144-1146 ◽  
Author(s):  
Charles H. Winter ◽  
T. Suren Lewkebandara ◽  
James W. Proscia
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Titanium Disulfide ◽  
Pressure Chemical
Sign in / Sign up

Export Citation Format

Share Document