Doped Silicon Oxide Deposition by Atmospheric Pressure and Low Temperature Chemical Vapor Deposition Using Tetraethoxysilane and Ozone

K. Fujino; Y. Nishimoto; N. Tokumasu; K. Maeda

doi:10.1149/1.2085358

Doped Silicon Oxide Deposition by Atmospheric Pressure and Low Temperature Chemical Vapor Deposition Using Tetraethoxysilane and Ozone

Journal of The Electrochemical Society ◽

10.1149/1.2085358 ◽

1991 ◽

Vol 138 (10) ◽

pp. 3019-3024 ◽

Cited By ~ 16

Author(s):

K. Fujino ◽

Y. Nishimoto ◽

N. Tokumasu ◽

K. Maeda

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Silicon Oxide ◽

Chemical Vapor ◽

Doped Silicon ◽

Oxide Deposition

Download Full-text

Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon Oxide Layers for Low-Temperature Thin Film Transistors

10.7567/ssdm.2019.ps-10-11 ◽

2019 ◽

Author(s):

H. Kakiuchi ◽

H. Ohmi ◽

K. Yasutake

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Thin Film Transistors ◽

Silicon Oxide ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Oxide Layers

Download Full-text

Homoleptic Tin and Silicon Amido Compounds as Precursors for Low-Temperature Atmospheric Pressure Chemical Vapor Deposition of Tin and Silicon Oxide Thin Films

Chemistry of Materials ◽

10.1021/cm00040a005 ◽

1994 ◽

Vol 6 (4) ◽

pp. 360-361 ◽

Cited By ~ 5

Author(s):

Lauren M. Atagi ◽

David M. Hoffman ◽

Jia-Rui Liu ◽

Zongshuang Zheng ◽

Wei-Kan Chu ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Silicon Oxide ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Pressure Chemical

Download Full-text

Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1470510 ◽

2002 ◽

Vol 20 (3) ◽

pp. 828 ◽

Cited By ~ 12

Author(s):

Hongqiang Lu ◽

Hao Cui ◽

Ishwara Bhat ◽

Shyam Murarka ◽

Williams Lanford ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Oxide Film ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Silicon Oxide Film ◽

Doped Silicon ◽

Deposition Technology

Download Full-text

Low-temperature atmospheric pressure chemical vapor deposition of titanium disulfide films

Chemistry of Materials ◽

10.1021/cm00024a007 ◽

1992 ◽

Vol 4 (6) ◽

pp. 1144-1146 ◽

Cited By ~ 12

Author(s):

Charles H. Winter ◽

T. Suren Lewkebandara ◽

James W. Proscia

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Titanium Disulfide ◽

Pressure Chemical

Download Full-text

Semi-Insulating Oxygen-Doped Silicon by Low Temperature Chemical Vapor Deposition for SOI Applications

Physical and Technical Problems of SOI Structures and Devices ◽

10.1007/978-94-011-0109-7_5 ◽

1995 ◽

pp. 55-66

Author(s):

J. C. Sturm ◽

P. V. Schwartz ◽

Z. Liliental-Weber

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Doped Silicon

Download Full-text

Field emission properties of carbon nanotubes synthesized by capillary type atmospheric pressure plasma enhanced chemical vapor deposition at low temperature

Carbon ◽

10.1016/j.carbon.2005.12.020 ◽

2006 ◽

Vol 44 (8) ◽

pp. 1530-1534 ◽

Cited By ~ 28

Author(s):

Se-Jin Kyung ◽

Yong-Hyuk Lee ◽

Chan-woo Kim ◽

June-Hee Lee ◽

Geun-Young Yeom

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Field Emission ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Field Emission Properties ◽

Capillary Type

Download Full-text

Low-temperature atmospheric-pressure metal-organic chemical vapor deposition of molybdenum nitride thin films

Thin Solid Films ◽

10.1016/s0040-6090(96)08867-0 ◽

1996 ◽

Vol 288 (1-2) ◽

pp. 116-119 ◽

Cited By ~ 28

Author(s):

Renaud Fix ◽

Roy G. Gordon ◽

David M. Hoffman

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Organic Chemical ◽

Molybdenum Nitride ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

Download Full-text

Growth Rate Enhancement of Heavy n‐ and p‐Type Doped Silicon Deposited by Atmospheric‐Pressure Chemical Vapor Deposition at Low Temperatures

Journal of The Electrochemical Society ◽

10.1149/1.2220890 ◽

1993 ◽

Vol 140 (9) ◽

pp. 2703-2709 ◽

Cited By ~ 24

Author(s):

P. D. Agnello ◽

T. O. Sedgwick ◽

J. Cotte

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Low Temperatures ◽

Chemical Vapor ◽

Rate Enhancement ◽

Doped Silicon ◽

Pressure Chemical ◽

P Type

Download Full-text

Low‐temperature chemical vapor deposition of epitaxial Si and SiGe layers at atmospheric pressure

Applied Physics Letters ◽

10.1063/1.104338 ◽

1991 ◽

Vol 58 (12) ◽

pp. 1286-1288 ◽

Cited By ~ 70

Author(s):

W. B. de Boer ◽

D. J. Meyer

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor

Download Full-text

Some etch properties of doped and undoped silicon oxide films formed by atmospheric pressure and plasma-activated chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.582947 ◽

1985 ◽

Vol 3 (6) ◽

pp. 1604 ◽

Cited By ~ 3

Author(s):

F. Gualandris

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Silicon Oxide ◽

Oxide Films ◽

Chemical Vapor

Download Full-text