A Theoretical Prediction of Film Thickness Profiles in a Mixed Convection‐Diffusion Regime for the Chemical Vapor Deposition of Polysilicon in Annular Tubes
1986 ◽
Vol 133
(10)
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pp. 2123-2131
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2014 ◽
Vol 2014
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pp. 1-7
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2013 ◽
Vol 28
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pp. 696-701
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2018 ◽
Vol 57
(5)
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pp. 052301
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