Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode
2012 ◽
Vol 2012
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pp. 1-6
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Keyword(s):
Niobium-doped titanium dioxide (TiO2) nanoparticles were used as a photoanode in dye-sensitized solar cells (DSCs). They showed a high photocurrent density due to their higher conductivity; however, a low open-circuit voltage was exhibited due to the back-reaction of photogenerated electrons. Atomic layer deposition is a useful technique to form a conformal ultrathin layer of Al2O3and HfO, which act as an energy barrier to suppress the back electrons from reaching the redox medium. This resulted in an increase of the open-circuit voltage and therefore led to higher performance. HfO showed an improvement of the light-to-current conversion efficiency by 74%, higher than the 21% enhancement obtained by utilizing Al2O3layers.
2014 ◽
Vol 2014
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pp. 1-7
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2012 ◽
Vol 476-478
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pp. 1767-1770
2011 ◽
Vol 50
(6)
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pp. 06GF08
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Keyword(s):
2016 ◽
Vol 220
◽
pp. 169-175
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