Composition Control of CuInSe2 Thin Films Using Cu/In Stacked Structure in Coulometric Controlled Electrodeposition Process

2015 ◽  
Vol 15 (10) ◽  
pp. 7836-7840
Author(s):  
Yong Hun Kwon ◽  
Hyun Woo Do ◽  
Hyoungsub Kim ◽  
Hyung Koun Cho
Keyword(s):  
Thin Films ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Rich Region ◽  
Electrodeposition Process ◽  
Composition Control ◽  
Glass Substrates ◽  
Coulometric Method ◽  
Thermal Evaporator ◽  
Composition Ratios

Cu/In bi-metal stacked structures were prepared on Mo coated soda lime glass substrates using electrodeposition method. These metallic precursors were selenized at 550 °C for 60 min to synthesize the CuInSe2 (CIS) thin films in a thermal evaporator chamber with an Se overpressure atmosphere. The composition ratios of CIS thin films were systematically controlled using the coulometric method of the electrodeposition, where the accumulated coulomb of In layers was varied from 1062 to 6375 mC/cm2. As a result, the stoichiometric CIS film was obtained in the Cu/In coulomb ratio of 0.6. Highly crystallized CIS films were produced from the liquid Cu–Se phase in the Cu/In coulomb ratio of ≥ 0.6. In contrast, the crystallinity and grain size were degraded in the In-rich region. We found that the Cu/In composition ratio of CIS films was linearly proportional to the precursor thickness determined by the coulomb ratio.

Influence of Deposition Time and Source-Substrate Distance on Properties of CdTe Thin Films Using Close-Spaced Sublimation at Higher Source Temperature

2013 ◽  
Vol 716 ◽  
pp. 325-327
Author(s):  
Xiao Yan Dai ◽  
Cheng Wu Shi ◽  
Yan Ru Zhang ◽  
Min Yao
Keyword(s):  
Thin Films ◽  
Deposition Time ◽  
Near Infrared ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
X Ray ◽  
Source Temperature ◽  
Glass Substrates ◽  
Substrate Distance ◽  
Cdte Thin Films

In this paper, CdTe thin films were deposited on soda-lime glass substrates using CdTe powder as a source by close-spaced sublimation at higher source temperature of 700°C. The influence of the deposition time and the source-substrate distance on the chemical composition, crystal phase, surface morphology and optical band gap of CdTe thin films was systemically investigated by energy dispersive X-ray spectroscopy, X-ray diffraction, scanning electron microscope and the ultraviolet-visible-near infrared absorption spectra, respectively. At the deposition time of 60 min and the source-substrate distance of 5 mm, the CdTe thin films had pyramid appearance with the grain size of 15 μm.

scholarly journals Adhesion Improvement and Characterization of Magnetron Sputter Deposited Bilayer Molybdenum Thin Films for Rear Contact Application in CIGS Solar Cells

2016 ◽  
Vol 2016 ◽  
pp. 1-10 ◽  
Author(s):  
Weimin Li ◽  
Xia Yan ◽  
Armin G. Aberle ◽  
Selvaraj Venkataraj
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Magnetron Sputtering ◽  
Surface Oxidation ◽  
Bottom Layer ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Individual Layer ◽  
Glass Substrates ◽  
Cigs Solar Cells

Molybdenum (Mo) thin films are widely used as rear electrodes in copper indium gallium diselenide (CIGS) solar cells. The challenge in Mo deposition by magnetron sputtering lies in simultaneously achieving good adhesion to the substrates while retaining the electrical and optical properties. Bilayer Mo films, comprising five different thickness ratios of a high pressure (HP) deposited bottom layer and a low pressure (LP) deposited top layer, were deposited on 40 cm × 30 cm soda-lime glass substrates by DC magnetron sputtering. We focus on understanding the effects of the individual layer properties on the resulting bilayer Mo films, such as microstructure, surface morphology, and surface oxidation. We show that the thickness of the bottom HP Mo layer plays a major role in determining the micromechanical and physical properties of the bilayer Mo stack. Our studies reveal that a thicker HP Mo bottom layer not only improves the adhesion of the bilayer Mo, but also helps to improve the film crystallinity along the preferred [110] direction. However, the surface roughness and the porosity of the bilayer Mo films are found to increase with increasing bottom layer thickness, which leads to lower optical reflectance and a higher probability for oxidation at the Mo surface.

scholarly journals Preparation and Characterization of Molybdenum Thin Films by Direct-Current Magnetron Sputtering

2017 ◽  
Vol 2 (1) ◽  
pp. 54-59 ◽  
Author(s):  
Shih-Fan Chen ◽  
Shea-Jue Wang ◽  
Win-Der Lee ◽  
Ming-Hong Chen ◽  
Chao-Nan Wei ◽  
...  
Keyword(s):  
Thin Films ◽  
Direct Current ◽  
Hall Effect Measurement ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
X Ray Diffraction ◽  
Working Pressure ◽  
Low Resistivity ◽  
Glass Substrates ◽  
Deposition Conditions

The back contact electrode with molybdenum (Mo) thin film is crucial to the performance of Cu(In, Ga)Se2 solar cells. In this research, Mo thin films were fabricated by direct current sputtering to attain low-resistivity molybdenum films on soda-lime glass substrates with good adhesion. The films were sputtered onto substrates in 500 nm thickness and nominally held at room temperature with deposition conditions of power and working pressure. Low resistivity (17-25 μΩ∙cm) of bi-layer molybdenum thin films were achieved with combination of top layer films deposited at 300 W with different working pressure, and bottom fixing layer film deposited at 300 W with 2.5 mTorr which adhered well on glass. Films were characterized the electrical properties, structure, residual stress, morphology by using the Hall-effect Measurement, X-ray Diffraction, and Field-Emission Scanning Electron Microscopy, respectively, to optimize the deposition conditions.

Microscratch Analysis of The Adhesion Failure on Oxide Thin Films With Different Thickness

1996 ◽  
Vol 436 ◽  
Author(s):  
C. R. Ottermann ◽  
K. Bange ◽  
A. Braband ◽  
H. Haefke ◽  
W. Gutmannsbauer
Keyword(s):  
Thin Films ◽  
Chemical Vapour ◽  
Soda Lime ◽  
Fused Silica ◽  
Soda Lime Glass ◽  
Test Results ◽  
Glass Substrates ◽  
Adhesion Failure ◽  
Different Thickness ◽  
Deposition Techniques

AbstractAdhesion failures of Ti2 and Ta2O5 thin films deposited by reactive evaporation (RE), reactive ion plating (IP) and plasma impulse chemical vapour deposition (PICVD) on fused silica, AF 45, TEMPAX and soda-lime glass substrates are investigated by means of a micro-scratch tester. The oxide films possess thickness between 60 and 500 nm and show different mass densities depending on the deposition conditions. Scratch testing exhibits well pronounced detachment for thicker films on hard substrates. The clearance of the scratch signal is reduced with decreasing layer thickness or for softer substrate materials. The test results are also influenced by the various substrates and different chemical and mechanical properties of the films due to the alternate deposition techniques.

The Effect of Sputtering Power on the Properties of One-step Deposited Cu2ZnSnSe4 Thin Films

2014 ◽  
Vol 1603 ◽  
Author(s):  
Yong Yan ◽  
Shasha Li ◽  
Zhou Yu ◽  
Yong Zhang ◽  
Yong Zhao
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Room Temperature ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Radio Frequency Magnetron Sputtering ◽  
Glass Substrates ◽  
Sputtering Power ◽  
One Step ◽  
Deposited Films

ABSTRACTCu2ZnSnSe4 films were deposited on soda lime glass substrates at room temperature by one-step radio frequency magnetron-sputtering process. The effect of sputtering power on the properties of one-step deposited Cu2ZnSnSe4 thin films has been investigated. The deposited films might be suitable for the absorber layers in the solar cells. The chemical composition and the preferred orientation of the films can be optimized by the sputtering power.

Preparation of TiFe thin Films by Pulsed Ion Beam Evaporation

2001 ◽  
Vol 697 ◽  
Author(s):  
Hisayuki Suematsu ◽  
Tsuyoshi Saikusa ◽  
Tsuneo Suzuki ◽  
Weihua Jiang ◽  
Kiyoshi Yatsui
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Pulse Width ◽  
Ion Beam ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
A Current

AbstractThin films of titanium iron (TiFe) were prepared by a pulsed ion-beam evaporation (IBE) method. A pulsed ion beam of proton accelerated at 1 MV (peak) with a pulse width of 50 ns and a current of 70 kA was focused on TiFe alloy targets. Soda lime glass substrates were placed in front of the targets. Phases in the thin films were identified by X-ray diffraction (XRD). XRD results revealed that the thin films deposited on the glass substrates consist of a TiFe phase. Crystallized Ti-Fe thin films without oxides were successfully obtained. Surface roughness of the thin film was 0.16 m m.

DETERMINATION OF THE OPTICAL CONSTANTS OF InxSey THIN FILMS DEPOSITED BY EVAPORATION AND COEVAPORATION

2002 ◽  
Vol 09 (05n06) ◽  
pp. 1687-1691 ◽  
Author(s):  
J. SANDINO ◽  
G. GORDILLO
Keyword(s):  
Thin Films ◽  
Optical Constants ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Interference Effects ◽  
Spectral Transmittance ◽  
Cauchy Equation ◽  
Glass Substrates ◽  
Special Procedure

In x Se y thin films, grown on soda lime glass substrates in the In 6 Se 7 phase by evaporation of the In 2 Se 3 compound and in the In 2 Se 3 phase by coevaporation of In and Se, were optically characterized through spectral transmittance measurements. A special procedure was developed to determine the thickness d and the optical constants (refractive index n, absorption coefficient α, and optical gap Eg). This includes experimental measurements of the spectral transmittance and the use of a model taking into account interference effects induced by internal reflections presented in the interfaces substrate/film and film/air and the fitting of the n vs. λ curve to the Cauchy equation (n = A + B/λ2). The optical constants of the In x Se y thin films were corrected comparing the experimental transmittance spectrum with the theoretical one. The results revealed that the optical constants of the In x Se y films were significantly affected by the deposition method.

scholarly journals Effect of Deposition Time on Structural and Optoelectronic Properties of Flower-Like Nanostructured PbS Thin Films

2021 ◽  
Vol 13 (1) ◽  
pp. 9-20
Author(s):  
N. H. Sheeba ◽  
A. Namitha ◽  
K. M. Ramsiya ◽  
T. M. Ashitha ◽  
R. Suhail
Keyword(s):  
Thin Films ◽  
Deposition Time ◽  
Gas Sensing ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Sem Images ◽  
Glass Substrates ◽  
Sensing Applications ◽  
Vis Spectroscopy ◽  
Two Peaks

Polycrystalline nanostructured PbS thin films are deposited onto soda-lime glass substrates by the method of chemical bath deposition (CBD) at different duration of deposition time. The structure and surface morphology of the films are characterized by X-ray diffraction (XRD) and field effect scanning electron microscopy (FE-SEM). XRD pattern exhibits polycrystalline structure with preferential orientation along (200) direction, parameters such as crystallite size, lattice constant, lattice-strain and dislocation density are calculated. The FE-SEM images show appearance of flower like structure on formation of PbS films which is indicative of suitability in gas sensing applications. Studies on optical properties carried out by UV-Vis spectroscopy measurements show bandgap in the range 1.65eV – 1.41eV. The photoluminescence spectra of the films exhibit two peaks centered at around 613 nm and 738 nm after excitation at 450 nm. Electrical studies from Hall measurements indicate the carrier concentration and mobility of the PbS samples corroborate the variations in the conductivity.

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