scholarly journals Application of response surface methodology for optimization of natural organic matter degradation by UV/H2O2 advanced oxidation process

2014 ◽  
Vol 12 (1) ◽  
Author(s):  
Reza Rezaee ◽  
Afshin Maleki ◽  
Ali Jafari ◽  
Sajad Mazloomi ◽  
Yahya Zandsalimi ◽  
...  
Keyword(s):  
Response Surface Methodology ◽  
Organic Matter ◽  
Response Surface ◽  
Natural Organic Matter ◽  
Advanced Oxidation Process ◽  
Oxidation Process ◽  
Advanced Oxidation ◽  
Organic Matter Degradation

Biofilm control in water by advanced oxidation process (AOP) pre-treatment: effect of natural organic matter (NOM)

2011 ◽  
Vol 64 (9) ◽  
pp. 1876-1884 ◽  
Author(s):  
Anat Lakretz ◽  
Eliora Z. Ron ◽  
Tali Harif ◽  
Hadas Mamane
Keyword(s):  
Organic Matter ◽  
Natural Organic Matter ◽  
Biofilm Formation ◽  
Natural Waters ◽  
Advanced Oxidation Process ◽  
Oxidation Process ◽  
Advanced Oxidation ◽  
Post Treatment ◽  
Control Effect ◽  
Biofilm Control

The main goal of this study was to examine the influence of natural organic matter (NOM) on the efficiency of H2O2/UV advanced oxidation process (AOP) as a preventive treatment for biofilm control. Pseudomonas aeruginosa PAO1 biofilm-forming bacteria were suspended in water and exposed to various AOP conditions with different NOM concentrations, and compared to natural waters. H2O2/UV prevented biofilm formation: (a) up to 24 h post treatment – when residual H2O2 was neutralized; (b) completely (days) – when residual H2O2 was maintained. At high NOM concentrations (i.e. 25 mg/L NOM or 12.5 mg/L DOC) an additive biofilm control effect was observed for the combined H2O2/UV system compared to UV irradiation alone, after short biofilm incubation times (<24 h). This effect was H2O2 concentration dependent and can be explained by the high organic content of these water samples, whereby an increase in NOM could enhance •OH production and promote the formation of additional reactive oxygen species. In addition, maintaining an appropriate ratio of bacterial surviving conc.: residual H2O2conc. post-treatment could prevent bacterial regrowth and biofilm formation.

Optimization of treating phenol from wastewater through the TiO2-catalyzed advanced oxidation process and response surface methodology

2019 ◽  
Vol 191 (6) ◽  
Author(s):  
Camila Oliveira Guimarães ◽  
Alexandre Boscaro França ◽  
Gisella Rossana Lamas Samanamud ◽  
Eduardo Prado Baston ◽  
Renata Carolina Zanetti Lofrano ◽  
...  
Keyword(s):  
Response Surface Methodology ◽  
Response Surface ◽  
Advanced Oxidation Process ◽  
Oxidation Process ◽  
Advanced Oxidation

Influence of mineral water constituents, organic matter and water matrices on the performance of the H2O2/IO4−-advanced oxidation process

2019 ◽  
Vol 5 (11) ◽  
pp. 1985-1992 ◽  
Author(s):  
Nor Elhouda Chadi ◽  
Slimane Merouani ◽  
Oualid Hamdaoui ◽  
Mohammed Bouhelassa ◽  
Muthupandian Ashokkumar
Keyword(s):  
Organic Matter ◽  
Water Treatment ◽  
Mineral Water ◽  
Advanced Oxidation Process ◽  
Oxidation Process ◽  
Advanced Oxidation ◽  
Water Constituents

We have recently reported that the reaction of H2O2/IO4− could be a new advanced oxidation process for water treatment [N. E. Chadi, S. Merouani, O. Hamdaoui, M. Bouhelassa and M. Ashokkumar, Environ. Sci.: Water Res. Technol., 2019, 5, 1113–1123].

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