scholarly journals Photoluminescence of Silicon Nanostructures Formed by Ion Beam Implantation

1992 ◽  
Vol 279 ◽  
Author(s):  
D. A. Redman ◽  
D. M. Follstaedt ◽  
T. Guilinger ◽  
M. Kelly

ABSTRACTA new method was used to fabricate nanometer-scale structures in Si for photoluminescence (PL) studies. He ions were implanted to form a dense subsurface layer of small cavities (1–8 nm diameters). The implanted specimens were either annealed in H or anodized with HF to evaluate the quantum confinement model for PL from porous Si. Incomplete passivation apparently prevented PL in the H-annealed specimens. Implantation combined with anodization produced a substantial blue shift relative to anodization alone, which is consistent with quantum confinement.

2000 ◽  
Vol 14 (15) ◽  
pp. 1559-1566 ◽  
Author(s):  
NGUYEN THI VAN OANH ◽  
NGUYEN AI VIET

We propose in this work a simple quantum confinement theory for excitons based on the effective mass approximation, for investigation of optical properties of indirect gap nanostructures. We show that using this simple model, we can get the analytic solutions and reobtain the main tight-binding approximation numerical results of Hill et al.1 for silicon nanostructures: blue shift of band gap and increase overlap between the states at the band edges when the nanostructures size in decreased.


1993 ◽  
Vol 298 ◽  
Author(s):  
Fereydoon Namavar ◽  
R.F. Pinizzotto ◽  
H. Yang ◽  
N. Kalkhoran ◽  
P. Maruska

AbstractHigh resolution cross-sectional electron microscopy and electron diffraction of an np heterojunction porous Si device, capable of emitting light at visible wavelengths, clearly indicates the presence of Si nanostructures within the quantum size regime. These results indicate that the quantum confinement effect is at least partially responsible for photoluminescence at visible wavelengths.


1993 ◽  
Vol 298 ◽  
Author(s):  
T. Van Buuren ◽  
T. Tiedje ◽  
W. Weydanz

AbstractHigh resolution measurements of the silicon L-edge absorption in electrochemically prepared porous silicon show that the absorption threshold is shifted to higher energy relative to bulk silicon, and that the shift is dependent on how the porous silicon is prepared. When the porous silicon is made from n-type material with light exposure, the blue shift increases logarithmically with the anodizing current. Porous silicon prepared by anodizing p-type silicon exhibits a blue shift in the L-edge which increases with the time spent in the HF solution after the anodizing potential is turned off. The data are consistent with the quantum confinement model for the electronic structure of porous silicon.


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